Varian
Kestrel II 750
The Varian Kestrel II 750 is an ion implantation system for semiconductor wafer doping. The Varian Kestrel II 750 uses a 10 Site Disk and processes 10 wafers per batch. The Varian Kestrel II 750 has an energy range of 10 to 3750 kV.[1][2]
Wafer size
10 Site Disk, 10 Wafer per Batch
Power
Power Supply Interface (PSI) Controller[2]
Vacuum
Source Vacuum Controller[2]
Gas delivery
Fully Automated Gas Box, 4 Gas Modules[2]
Optics
Included[1]
What is it?
Applications
The Varian Kestrel II 750 is used for semiconductor wafer doping by ion implantation.[1]
What do the numbers mean?
Power & electrical4
- Power Supply Interface (PSI) Controller[2]
Vacuum & pumping2
- Source Vacuum Controller[2]
Wafer handling4
Gas & chemistry5
- Fully Automated Gas Box, 4 Gas Modules[2]
Optics & imaging1
Control & software4
Configuration & options19
- High current[3]
- Automatic Handling system[2]
- Argon (factory inlet)[2]
- PH3 SDS[2]
- AsH3 SDS[2]
- BF3 SDS[2]
- On Board Argon Option Installed (Semi Automated Filling of Stripper Reservoirs[2]
- Spare Parts:[2]
- Suppression PS[2]
- Arc Sense PS[2]
- Analyser Magnet PS[2]
- Accel Driver Assy[2]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- ConfigurationFully Automated Gas Box, 4 Gas Modules[2]
- ConfigurationPower Supply Interface (PSI) Controller[2]
- ConfigurationSource Vacuum Controller[2]
- Voltage30 kV Terminal PS[2]
- Voltage60 kV Tube Lens PS[2]
- Gas Modules4 Gas Modules[2]
- GasesArgon (factory inlet), PH3 SDS, AsH3 SDS, BF3 SDS[2]
- Power Supply Interface (PSI) ControllerIncluded[1]
- Source Vacuum ControllerIncluded[1]
- Gas boxFully Automated Gas Box, 4 Gas Modules[2]
- Gas deliveryFully Automated Gas Box, 4 Gas Modules[2]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What type of equipment is the Varian Kestrel II 750?
The Varian Kestrel II 750 is an ion implantation system.[1]
Not publicly documented
The following facts about the Kestrel II 750 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Kestrel II 750 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Kestrel II 750 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Kestrel II 750 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Kestrel II 750 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Kestrel II 750 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]waferpedia.com — waferpedia.comwaferpedia.com
- [2]Inventory photo
- [3]inventory listing
- [4]Equipment inventory listing
Last updated Oct 19, 2026.
Compare with similar tools
View all →The Varian 0216 7696, E 11368072 ESC is an electrostatic chuck (ESC) platen of the ADV-S type, categorized under ion implantation equipment.
The Varian 160 XP is an ion implanter. A variant, the Varian 160 XP Ion, is configured as a 150 mm high-current implanter.
The Varian 160 XP Ion is an ion implantation tool configured as a 150mm high-current implanter.