Varian

Ion implanters are semiconductor manufacturing tools that introduce dopant species into a wafer by accelerating ions and directing them into the surface. Ion implantation is used to set electrical properties in selected regions of semiconductor devices. Ion implanters are part of the front end device fabrication flow and are used where controlled dopant placement is required.
Ion implantation is typically performed after films and patterned masks define where dopants should enter the wafer. Implant steps are commonly followed by thermal processing that activates dopants and repairs implant damage. Ion implantation is used repeatedly through device fabrication for wells, source and drain regions, channel engineering, and related junction formation tasks.
Ion implanters are used for semiconductor doping steps in integrated circuit manufacturing. Ion implantation supports formation of electrically active regions in silicon and other semiconductor structures. Implant processes can be used for threshold adjustment, junction formation, isolation related structures, and contact or resistor engineering depending on the device flow.
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| Viision 80 High Current | — | — | High current variant | Equipment inventory listing[3] |
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The following facts about the Viision 80 Ion are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Viision 80 Ion are on record.
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The control-system platform and OS era of the Viision 80 Ion are not on record.
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No publicly documented failure modes or field errata for the Viision 80 Ion are on record.
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The process node or technology generation of the Viision 80 Ion is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the Viision 80 Ion are on record.
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Last updated Oct 18, 2026.
The Varian 0216 7696, E 11368072 ESC is an electrostatic chuck (ESC) platen of the ADV-S type, categorized under ion implantation equipment.
The Varian 160 XP is an ion implanter. A variant, the Varian 160 XP Ion, is configured as a 150 mm high-current implanter.
The Varian 160 XP Ion is an ion implantation tool configured as a 150mm high-current implanter.