Veeco
IBS-2 Ion Beam
The Veeco IBS-2 Ion Beam is an ion beam deposition (IBD) system that supports 6-inch wafer sizes. The Veeco IBS-2 Ion Beam is configured with six targets, two ion guns, and two fully functional ion beams.[1][2][3]
What it is
How it works
General reference — not yet source-verifiedIon beam deposition uses one or more ion beams to assist material removal from a source and to deposit material onto a substrate.
A deposition system of this class typically combines beam generation, vacuum handling, and wafer fixturing to control film growth on the substrate.
Where it fits in the process flow
General reference — not yet source-verifiedIon beam deposition sits in thin-film formation steps where a fabricated substrate receives a deposited layer under vacuum.
A deposition tool of this class is used after a substrate is prepared for coating and before later patterning or integration steps.
Applications
General reference — not yet source-verifiedIon beam deposition is used for thin-film coating on wafers.
What do the numbers mean?
Power & electrical3
Vacuum & pumping4
Wafer handling3
- 6” Chuck for round wafers and 7” chuck for square wafers[1]
Configuration & options16
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- ConfigurationHandful of parts have been upgraded including a new RF Generator[1]
- ConfigurationNew Generator[1]
- ConfigurationRefurbished Turbo pump[1]
- Configuration2 Cryo pumps[1]
- Configuration2 Edwards XDS10 Scroll pumps[1]
- Vacuum and pumpingRefurbished turbo pump; 2 cryo pumps; 2 Edwards XDS10 scroll pumps[1]
- RF generatorUpgraded with a new RF generator[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the IBS-2 Ion Beam are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the IBS-2 Ion Beam are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the IBS-2 Ion Beam are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the IBS-2 Ion Beam are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the IBS-2 Ion Beam are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the IBS-2 Ion Beam is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]waferpedia.com — waferpedia.comwaferpedia.com
- [3]waferpedia.com — waferpedia.comwaferpedia.com
Last updated Oct 12, 2026.
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