Veeco

The Veeco 4-point probe measures sheet resistance and material resistivity of semiconductor wafers and resistive films.

Veeco / Wyko NT 3300 Surface Profilometer is a surface profilometer used for metrology and inspection.

Veeco Dektak 150 is a stylus-based surface profiler used for measuring surface topography and thin film step heights.

Veeco WaferStorm 3303 is an automated solvent processor with a 300mm FOUP load port, wafer mapping and RFID reader, and robotic handling for 200/300mm wafers.

The Veeco AP 300 E Lithography System is a lithography tool with 2.0 µm resolution, extended-field ghi-line broadband optics, and handling features for 200 mm and 300 mm wafers including warped wafer handling to 500 µm.

General referenceVeeco K 465 GaN MOCVD is a metal-organic chemical vapor deposition system for depositing compound semiconductor thin films. Machines of this class are used to grow epitaxial layers from reactive vapor precursors in a controlled reactor environment.

The Veeco / SSEC 3303 Lift Off Machine is a lift-off process machine for 6-inch wafers.

The Veeco / Wyko NT 3300 SU is a 2D/3D profiler with a 6-inch or 8-inch stage, motorized XYZ, motorized turret, auto focus, stitching, and full automation capability.

The Veeco RF 350 S is a one-chamber ion mill configured with argon gas and Windows 2000.

The Veeco Nexus IBE350 is a broad-beam ion etcher with a 350 mm Argon ion source, three-grids ion optics, and SIMS endpoint detection.

The Veeco / Wyko NT 9100 is a Surface Profiler.

The Veeco / SSEC Waferstorm M 3308 12 is a single wafer processing system for 6-inch wafers.

Veeco IBS-2 Ion Beam Deposition (IBD) is a deposition system with 6-inch wafer size support.

The Veeco ADS 800 Dicing System is a dicing system configured with a 220 VAC, 3-phase, 50/60 Hz, 30 Amp power requirement and includes motion, control, vision, and coolant delivery components.

The Veeco / SSEC Waferstorm M 3305 is a lift off machine.

Veeco / SSEC Waferstorm 3300 / M 3303 / M 3304 is a single wafer processing system for 6-inch wafers.

The Veeco / SSEC M 3303 is a manual-type scrubber with HDD and software, a soaking station, a process chamber, 6" I/O ports, and two load ports.

Veeco Spector Bare is a bare chamber described as including a frame and having no parts inside the chamber.

The Veeco C 2 Cluster is a PVD system with 6-inch wafer capacity and two chambers for AL2O3/SiO2 and Ta2O5.

Veeco TurboDisc K 465 GaN MOCVD is a metal organic chemical vapor deposition system.

The Veeco K 465 i is a GaN MOCVD (metal organic chemical vapor deposition) system.