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YES

1224 P

DepositionYES 1224 P family
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The YES 1224 P is a CVD system. The YES 1224 P is a chemical vapor deposition system. The YES 1224 P family includes the 1224 P model.[1][2][3][4]

1224 P — Inventory photo
Fig. 011224 PInventory photo[3]

Power

40 kHz[3]

Vacuum

Adixen Pascal 2021C2 vacuum pump (2)[5]

Performance

600 slides/hr for CVD[3]

Gas delivery

Software Specifications:[3]

Optics

0-999999[3]

What is it?

Applications

The YES 1224 P was later renamed the YES-ÉcoCoat. The YES 1224 P is used for vapor phase deposition for precise surface modification. The YES 1224 P supports coating applications that include DNA and oligonucleotide adhesion, glass slide surface modification, silane coating for MEMS, antifouling coating for medical devices, and copper barrier formation. The YES 1224 P incorporates a plasma cleaning function that cleans the substrate prior to silane vapor deposition.[4]

What do the numbers mean?

Power & electrical8

Power Requirements
208 VAC, 50/60 Hz, Single Phase, 25 FL Amps[1]
Accurate?
RF Plasma Frequency
40 kHz[3]
Accurate?
RF Plasma Power
10-1000 Watts[3]
Accurate?
Voltage
208V, 50/60Hz[5]
Accurate?
Power Requirements (first listing)
208 VAC, 50/60 Hz, Single Phase, 25 FL Amps[3]
Accurate?
Power Requirements (second listing)
208 VAC, 30 A, 60 Hz, Single Phase, 4835 Watts[3]
Accurate?
Power Requirements
208 VAC, 30 A, 60 Hz, Single Phase, 4835 Watts[3]
Accurate?
Power Supply
Automatic Frequency Tuning[3]
Accurate?

Vacuum & pumping3

Adixen Pascal 2021C2 vacuum pump (2)[5]
Accurate?
Reactant Gas Consumption
4.2 x 10-3 SCF (based on standard process: 170°C @ 1000 W w/20 SCFM pump)[3]
Accurate?
Vacuum Pump
Adixen Pascal 2021C2 vacuum pump (2)[5]
Accurate?

Wafer handling1

Wafer Throughput
Typically 1-2 loads/hr; varies by process[3]
Accurate?

Gas & chemistry7

Mass Flow Controls
Software Specifications:[3]
Accurate?
Chemical Usage
Typical process 3-5 ml[3]
Accurate?
Chemical Volume Control
Control down to 0.1 ml[3]
Accurate?
Process Gas Inputs
1[3]
Accurate?
Plasma Gas Inputs
3[3]
Accurate?
Chemical Usage (typical process)
3-5 ml[3]
Accurate?
Vent Gas Consumption
10 SCF run average[3]
Accurate?

Optics & imaging2

Range of Exposure Time
0-999999[3]
Accurate?
Resolution of Timer Setting
1 second[3]
Accurate?

Performance2

Uniformity
±5°C during dwell after stabilization period[3]
Accurate?
Slide Throughput
600 slides/hr for CVD[3]
Accurate?

Control & software4

Number of Recipes
6 CVD, 4 Plasma[3]
Accurate?
AMI 286 liquid level controller[5]
Accurate?
Liquid Level Controller
AMI 286 liquid level controller[5]
Accurate?
AMI 286 liquid level controller
AMI 286 liquid level controller[5]
Accurate?

Configuration & options15

Part Number
900-10580-01[3]
Accurate?
Clean Room Compatibility
Class 10[3]
Accurate?
Chamber Material
316L Stainless Steel[3]
Accurate?
Chamber Size
40.6 cm W x 46 cm D x 40.6 cm H (16" x 18" x 16")[3]
Accurate?
Loading
4 removable internal stainless steel shelves; up to 16 available configurations[3]
Accurate?
Filter
0.5 Micron filter[3]
Accurate?
Performance Specifications:[3]
Accurate?
Operation Temperature
Ambient to 205°C[3]
Accurate?
Advanced Energy PE-1000 AC plasma source, model 315502-005[5]
Accurate?
Chamber Size (interior)
40.6 cm W x 46 cm D x 40.6 cm H (16" x 18" x 16")[3]
Accurate?
Safety
Audible and visual alarms; redundant over-temp monitoring[3]
Accurate?
Plasma Source
Advanced Energy PE-1000 AC plasma source, model 315502-005[5]
Accurate?
Work Table
Mobile work table[5]
Accurate?
Make
YES[3]
Accurate?
Model
1224 P[3]
Accurate?

Vintage & configurations

Documented models & variants

DesignationGenerationVintageChangesSource
YES-ÉcoCoat——Renamed from the YES 1224 P.web.archive.org[4]
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What replaced it?

Alternatives

Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Power Requirements208 VAC, 50/60 Hz, Single Phase, 25 FL Amps[1]
  • Mass Flow ControlsSoftware Specifications:[3]
  • RF Plasma Frequency40 kHz[3]
  • RF Plasma Power10-1000 Watts[3]
  • Chemical UsageTypical process 3-5 ml[3]
  • Chemical Volume ControlControl down to 0.1 ml[3]
  • Process Gas Inputs1[3]
  • Plasma Gas Inputs3[3]
  • Voltage208V, 50/60Hz[5]
  • ConfigurationAdixen Pascal 2021C2 vacuum pump (2)[5]
  • Power Requirements (first listing)208 VAC, 50/60 Hz, Single Phase, 25 FL Amps[3]
  • Power Requirements (second listing)208 VAC, 30 A, 60 Hz, Single Phase, 4835 Watts[3]
  • Chemical Usage (typical process)3-5 ml[3]
  • Vent Gas Consumption10 SCF run average[3]
  • Reactant Gas Consumption4.2 x 10-3 SCF (based on standard process: 170°C @ 1000 W w/20 SCFM pump)[3]
  • Vacuum PumpAdixen Pascal 2021C2 vacuum pump (2)[5]
  • Power Requirements208 VAC, 30 A, 60 Hz, Single Phase, 4835 Watts[3]
  • Power SupplyAutomatic Frequency Tuning[3]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

How is the YES 1224 P configured for loading and recipes?

The YES 1224 P uses 4 removable internal stainless steel shelves with up to 16 available configurations. The YES 1224 P supports 6 CVD recipes and 4 plasma recipes.[3]

Not publicly documented

The following facts about the 1224 P are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 1224 P are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • The control-system platform and OS era of the 1224 P are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the 1224 P are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the 1224 P is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the 1224 P are on record.

    Answerable by: an OEM parts catalog or a service engineer

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Sources & citations

Sources (10)Every fact above is drawn from these public sources
  1. [1]waferpedia.com — waferpedia.comwaferpedia.com
  2. [2]YES 1224 P family | Waferpedia — waferpedia.comwaferpedia.com
  3. [3]Inventory photo
  4. [4]web.archive.org — yieldengineering.com (Dec 8, 2015)web.archive.org
  5. [5]Inventory photo
  6. [6]Inventory photo
  7. [7]Inventory photo
  8. [8]Equipment inventory listing
  9. [9]Equipment inventory listing
  10. [10]pmd.mri.psu.edu — pmd.mri.psu.edupmd.mri.psu.edu
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Last updated Oct 21, 2026.

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