YES
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The YES 15 HMDS Vapor Prime Oven is a vacuum oven designed for HMDS vapor priming to improve photoresist adhesion on wafers. The YES 15 HMDS Vapor Prime Oven uses hexamethyldisilazane (HMDS) vapor that forms a monolayer on wafer surfaces after dehydration at 150 °C. The YES 15 HMDS Vapor Prime Oven has a chamber of 16x16x16 inches with a fixed shelf and 1700W heaters.[1]
The YES 15 features a chamber measuring 16 inches by 16 inches by 16 inches with a fixed shelf. The oven includes 1700 watt heaters, a temperature controller, an HMDS cylinder, a logical sequencer, and a Granville Phillips 275 Convectron gauge. The system is capable of processing 8-inch wafers.[2][4][3]
The YES 15 operates by dehydrating clean wafers through a series of heated evacuations and dry nitrogen refills at 150 degrees Celsius. After dehydration, HMDS vapor is introduced into the evacuated chamber, where it adsorbs onto the wafer surfaces to form a monolayer. The system provides two selectable sequences: Sequence 1 for HMDS vapor prime, which takes approximately 30 minutes, and Sequence 2 for substrate dehydration only, which takes approximately 60 minutes. During operation, the oven temperature is maintained between 102 and 104 degrees Celsius.[1]
The oven can also be used for substrate dehydration alone, independent of HMDS priming. Both silicon and glass substrates are commonly processed in the system.[1]
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The following facts about the 15 HMDS Vapor Prime are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 15 HMDS Vapor Prime are on record.
Answerable by: OEM historical records or a trade-press announcement
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Last updated Sep 1, 2026.