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806 alternatives
Comparable Lithography equipment documented in the Waferpedia catalog.
6 comparable tools
CEE
100
6"
Lithography
The CEE 100 is a lithography spin coater/developer tool that accepts up to 6-inch wafers and supports programmable multi-step processing.
Heidelberg Instruments
DWL66
6"
Lithography
Heidelberg Instruments DWL66 is a high-resolution direct write pattern generator for direct writing on various substrates and mask making.
Raith
EBPG5200
6"
Lithography
Raith EBPG5200 is a direct write electron beam lithography system with high-kV capability and automation features stated in the product page for the EBPG line.
Nikon
NSR 2205 i 8 A i-Line
6"
Lithography
Nikon NSR 2205 i 8 A i-Line Stepper is a 6-inch wafer lithography stepper with a listed 0.5 µm resolution.
Brooks
017-0024-01 Prealigner
Lithography
Brooks
017-0146-01 Prealigner
Lithography
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