Raith

EBPG5200

Lithography 6"Raith EBPG5200 family

Research Quality: 30% complete

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RaithEBPG5200

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Wafer size

Power

125 MHz^[1]

Optics

EBPG Electron 100 kV^[1]

What is it?

The sources describe the EBPG5200 in the context of Raith's dedicated electron beam lithography products. The related EBPG5150 page states that it uses the same universal plinth platform as the EBPG5200, and the EBPG5150 product details list EBPG Electron 100 kV column technology and a 6" full travel stage as part of the EBPG series platform.

What can it run?

Process applications and technology nodes documented for this tool.

High aspect ratio nanostructures
High speed direct write
Batch production
Compound semiconductor devices
Anticounterfeiting security elements

What do the numbers mean?

Power & electrical2

Pattern generator: 125 MHz^[1]2 sources
Acceleration voltages: 20, 50 and 100 kV^[1]

Optics & imaging4

Technology: Direct write lithography / electron beam lithography^[1]
Column technology: EBPG Electron 100 kV^[1]
Overlay accuracy: ≤ 5 nm^[1]
Minimum feature size: Less than 8 nm^[1]

Configuration & options5

Platform: Universal plinth platform shared with EBPG5150^[1]
Stage: 6" full travel^[1]
Beam current: Up to 350 nA^[1]
Large field size: Continuously variable up to 1 mm at all kVs^[1]
Sample handling: Automatic 2 holder as standard; 10 holder optional^[1]

Vintage & configurations

Documented models & variants

Designation	Generation	Vintage	Changes	Source
EBPG5200+	—	—	Described as an electron beam lithography tool capable of high resolution patterning at 100 kV with a 125 MHz pattern generator, 350 nA maximum current, and 1 mm mainfield size.	wiki.nano.upenn.edu^[2]

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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

Pattern generator125 MHz^[1]
Acceleration voltages20, 50 and 100 kV^[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Not publicly documented

The following facts about the EBPG5200 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the EBPG5200 are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the EBPG5200 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the EBPG5200 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the EBPG5200 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the EBPG5200 are on record.
Answerable by: an OEM parts catalog or a service engineer