Raith
EBPG5200 alternatives
Comparable Lithography equipment documented in the Waferpedia catalog.
6 comparable tools
CEE
100
6"
Lithography
The CEE 100 is a lithography spin coater/developer tool that accepts up to 6-inch wafers and supports programmable multi-step processing.
OAI
806
6"
Lithography
The OAI 806 Mask Aligner is a precision photolithography tool for patterning substrates up to 6 inches with soft, hard, and proximity contact modes.
Heidelberg Instruments
DWL66
6"
Lithography
Heidelberg Instruments DWL66 is a high-resolution direct write pattern generator for direct writing on various substrates and mask making.
Nikon
NSR 2205 i 8 A i-Line
6"
Lithography
Nikon NSR 2205 i 8 A i-Line Stepper is a 6-inch wafer lithography stepper with a listed 0.5 µm resolution.
Brooks
017-0024-01 Prealigner
Lithography
Brooks
017-0146-01 Prealigner
Lithography
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