901e alternatives

75 mm to 150 mm round substrates; rectangular substrates from 100 mm to 125 mm on a side

Etch

The Tegal 903e is a diode plasma etch tool used for applications including oxide etching and other semiconductor and compound-semiconductor etch processes.

Etch

three- to six-inch wafers

Etch

The Tegal 1511e is a tri-electrode dual-frequency plasma etch system for processing three- to six-inch wafers.

8"

Etch

Lam Research 2300 is an etch system used for pattern transfer in semiconductor processing. It belongs to the class of plasma-based etch equipment used to remove selected material from a wafer according to a patterned mask.

Etch

Etch