Tegal
901e
Plate 01Tegal and Main Equipment Introduction Tegal 901e Tegal 903e Plasma Etcher
SemiStarWatch on YouTubePlate 02Upgrade Kit-Tegal 901e 903e 981 983 Plasma Etcher
Allwin21Watch on YouTubePlate 03Tegal 901e Tegal 903e Tegal 901e TTW Tegal 903e TTW Plasma Etch Semiconductor Equipment
Peter ChenWatch on YouTubePlate 04Allwin21 AW-901eR AW903eR Plasma Etcher RIE equipment, Reactive Ion Etching, -Tegal 901e Tegal 903e
Allwin21Watch on YouTubePlate 05AW-90XeR Plasma Etcher (Upgraded Tegal 901e, Tegal 903e)
Allwin21Watch on YouTubePlate 06Tegal 901e Tegal 903e Dry Plasma Etcher RIE semiconductor equipment
SemiStarWatch on YouTube
Wafer size
75 mm to 150 mm round substrates; rectangular substrates from 100 mm to 125 mm on a side
Introduced
2000
Node / era
down to 0.5 micron
What is it?
What can it run?
Process applications and technology nodes documented for this tool.
- GaAs device etching
- LOCOS nitride etch
- nitride contact/via etch
- zero layer etch
- backside etch
- isotropic oxide etch
- photoresist descum
- non-critical polysilicon etch
- titanium/tantalum alloy etch
- polysilicon etching
- oxide etching
What do the numbers mean?
Wafer handling2
Configuration & options3
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the 901e are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 901e are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 901e are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 901e are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 901e are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
No publicly documented compatible parts, consumables, or accessories for the 901e are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]web.archive.org — web.archive.orgweb.archive.org
- [2]web.archive.org — web.archive.orgweb.archive.org
- [3]TEGAL RECEIVES ORDER FOR 900 SERIES ETCH SYSTEMS FROM OPTO TECH — web.archive.orgweb.archive.org
Last updated Jul 29, 2026.
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General referenceLam Research 2300 is an etch system used for pattern transfer in semiconductor processing. It belongs to the class of plasma-based etch equipment used to remove selected material from a wafer according to a patterned mask.