Tegal
903e
Plate 01Tegal 901e Tegal 903e Dry Plasma Etcher RIE semiconductor equipment
SemiStarWatch on YouTubePlate 02Allwin21 AW-901eR AW903eR Plasma Etcher RIE equipment, Reactive Ion Etching, -Tegal 901e Tegal 903e
Allwin21Watch on YouTubePlate 03Tegal and Main Equipment Introduction Tegal 901e Tegal 903e Plasma Etcher
SemiStarWatch on YouTubePlate 04Tegal 903e PLasma Etcher Used Semiconductor Process Equipment
SemiStarWatch on YouTubePlate 05Tegal901e Tegal 903e Plasma Etch RIE Systems
Allwin21Watch on YouTubePlate 06Tegal 901e Tegal 903e Tegal 901e TTW Tegal 903e TTW Plasma Etch Semiconductor Equipment
Peter ChenWatch on YouTube
What is it?
What can it run?
Process applications and technology nodes documented for this tool.
- oxide contacts
- oxide etching
- pad etch
- passivation etch
- oxide/contact/via etch
- LDD spacer etch
- polyimide ILD etch
- resist/SOG planarization
- GaAs and other III-V materials applications
- pad passivation etch
- zero layer
- non-selective nitride
- backside etch
- planarization
- poly etch
What do the numbers mean?
Wafer handling4
- Substrate diameter range
- 75 mm to 150 mm round silicon and gallium arsenide (GaAs) substrates[1]
Configuration & options2
Vintage & configurations
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the 903e are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented variants, configuration options, or revision breakpoints of the 903e are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 903e are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 903e are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 903e is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the 903e are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]web.archive.org — web.archive.orgweb.archive.org
- [2]web.archive.org — web.archive.orgweb.archive.org
- [3]web.archive.org — web.archive.orgweb.archive.org
Last updated Jul 29, 2026.
Compare with similar tools
View all →The Tegal 901e is a diode plasma etcher used for GaAs and other semiconductor applications, with source-described substrate handling for 75 mm to 150 mm round wafers and some rectangular substrates.
The Tegal 1511e is a tri-electrode dual-frequency plasma etch system for processing three- to six-inch wafers.
General referenceLam Research 2300 is an etch system used for pattern transfer in semiconductor processing. It belongs to the class of plasma-based etch equipment used to remove selected material from a wafer according to a patterned mask.