Waferpedia

Tool family

Applied Materials P 5000 Mark II

Models in this family

  1. P 5000 Mark IIintroduced 1991

    Applied Materials P 5000 Mark II is a deposition system used to form thin films on semiconductor or precision-optics substrates. Machines of this class add controlled material layers to a prepared surface as part of device fabrication.

    Cited variants

    DesignationGenerationVintageChangesSource
    P 5000 Mark II PECVD, 8" DxZEquipment inventory listing[1]
    P 5000 Mark II PECVD, 8" DxLEquipment inventory listing[2]
    P 5000 Mark II PECVD, 8"1991Software: b6.02; 1991 Vintage.Equipment inventory listing[3]
    P 5000 Mark II PECVD, 6"2010Described as refurbished; includes a Wafer Orienter, Phase 3 Robot, Phase 3 Cassette Handler, and other listed hardware/options.Equipment inventory listing[4]

All entries

  1. P 5000 Mark IIApplied Materials

    General referenceApplied Materials P 5000 Mark II is a deposition system used to form thin films on semiconductor or precision-optics substrates. Machines of this class add controlled material layers to a prepared surface as part of device fabrication.

    CategoryDepositionWaferWafer Orienter
    29 specs
  2. P 5000 Mark II BPTEOSApplied Materials
    CategoryDeposition
    1 spec
  3. P 5000 Mark II CVD-PVDApplied Materials
    CategoryDeposition
    2 specs
  4. P 5000 Mark II DielectricApplied Materials
    CategoryEtch
    2 specs
  5. P 5000 Mark II DLHApplied Materials
    CategoryDeposition
    20 specs
  6. P 5000 Mark II JApplied Materials
    CategoryDeposition
    2 specs

Sources

Sources (4)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]Equipment inventory listing
  3. [3]Equipment inventory listing
  4. [4]Equipment inventory listing