Tool family
The KLA Quantox is a non-contact, corona-based silicon and oxide charge monitoring system that measures electrical characteristics such as charge composition, interface quality, dielectric thickness, and charge contamination of semiconductors and dielectric films.
Cited variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| Quantox XP | — | 2002 | Next-generation non-contact in-line electrical characterization system for 130 nm and below; uses ACTIV technology; accuracy within 0.10 Å; correlation >95% with device parameters. | kla.com[1] |
| Quantox 64000 | — | — | Monitoring model listed in Waferpedia. | waferpedia.com[2] |
| Quantox 64100 | — | — | Measurement model listed in Waferpedia. | waferpedia.com[2] |
The KLA Quantox 64000 Monitoring is a metrology and inspection system used for process monitoring in semiconductor manufacturing. Machines of this class are used to measure and track wafer or film conditions so process stability, tool health, and excursion detection can be managed through routine monitoring.
The KLA Quantox 64100 Measurement is a measurement system for semiconductor manufacturing.
The KLA Quantox is a non-contact, corona-based silicon and oxide charge monitoring system that measures electrical characteristics such as charge composition, interface quality, dielectric thickness, and charge contamination of semiconductors and dielectric films.
General referenceThe KLA Quantox 64000 Monitoring is a metrology and inspection system used for process monitoring in semiconductor manufacturing. Machines of this class are used to measure and track wafer or film conditions so process stability, tool health, and excursion detection can be managed through routine monitoring.
The KLA Quantox 64100 Measurement is a measurement system for semiconductor manufacturing.