Tool family
Oxford Instruments PlasmaPro 100
Models in this family
The Oxford PlasmaPro 100 Cobra is an etcher with 8 inch wafer size, an ICP chamber with Cl2 and BCl3 capability, and three RIE chambers.
Oxford Instruments PlasmaPro 100 Cobra ICP-RIE is an inductively coupled plasma reactive ion etch system with process capability for wafer sizes up to 200mm.
All entries
- PlasmaPro 100 CobraOxford Instruments
The Oxford PlasmaPro 100 Cobra is an etcher with 8 inch wafer size, an ICP chamber with Cl2 and BCl3 capability, and three RIE chambers.
CategoryEtch3 specs - PlasmaPro 100 Cobra ICP-RIEOxford Instruments
Oxford Instruments PlasmaPro 100 Cobra ICP-RIE is an inductively coupled plasma reactive ion etch system with process capability for wafer sizes up to 200mm.
CategoryEtch10 specs