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Oxford Instruments

PlasmaPro 100 Cobra

EtchOxford Instruments PlasmaPro 100 family
Research Quality: 60% complete

Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

PlasmaPro 100 Cobra — Inventory photo
Fig. 01PlasmaPro 100 CobraInventory photo[1]
  • Plate 01PlasmaPro 100 Estrelas DRIE – Oxford Instruments Plasma Technology

    Oxford InstrumentsWatch on YouTube

What it is

The Oxford Instruments PlasmaPro 100 Cobra is an inductively coupled plasma dry etcher used for semiconductor pattern transfer.[3][4][5]

What do the numbers mean?

Control & software1

With HDD and Software[1]
Accurate?

Configuration & options2

1x ICP Chamber with Cl2 and BCl3 Capability[1]
Accurate?
3x RIE Chambers[1]
Accurate?
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Where are the manuals?

Publicly hosted documents referencing this tool, linked at their original location. Hosted by the linked institutions — availability may change.

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Not publicly documented

Field notes

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Frequently asked questions

What type of etcher is the PlasmaPro 100 Cobra?

It is an inductively coupled plasma reactive ion etcher.[5][4]

Not publicly documented

The following facts about the PlasmaPro 100 Cobra are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the PlasmaPro 100 Cobra are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the PlasmaPro 100 Cobra are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the PlasmaPro 100 Cobra are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the PlasmaPro 100 Cobra are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the PlasmaPro 100 Cobra is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (8)Every fact above is drawn from these public sources
  1. [1]Inventory photo
  2. [2]epfl.chepfl.ch
  3. [3]Etching ‒ Center of MicroNanoTechnology CMi ‐ EPFLepfl.chepfl.ch
  4. [4]Oxford ICP Etcher (PlasmaPro 100 Cobra) - UCSB Nanofab Wikiwiki.nanotech.ucsb.eduwiki.nanotech.ucsb.edu
  5. [5]ETCH-17: Oxford ICP Etcher - ALE | Equipment | Maryland NanoCenter FabLabnanocenter.umd.edunanocenter.umd.edu
  6. [6]Equipment Capabilities - Electrical & Computer Engineeringece.utoronto.caece.utoronto.ca
  7. [7]Tool Details - Harvard CNScns1.rc.fas.harvard.educns1.rc.fas.harvard.edu
  8. [8]Utah-Nanofab-tool-list-July-2025-1nanofab.utah.edunanofab.utah.edu
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Last updated Jul 29, 2026.

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