Oxford Instruments
PlasmaPro 100 Cobra ICP-RIE
What is it?
What do the numbers mean?
Power & electrical2
- Advanced Energy paramount MF 5003 RF Generator[1]
Vacuum & pumping3
Wafer handling1
- Configured for 6" substrates[1]
Gas & chemistry1
- Gas Box[1]
Control & software1
- Control Computer & LCD Monitor[1]
Configuration & options2
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the PlasmaPro 100 Cobra ICP-RIE are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the PlasmaPro 100 Cobra ICP-RIE are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the PlasmaPro 100 Cobra ICP-RIE are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the PlasmaPro 100 Cobra ICP-RIE are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the PlasmaPro 100 Cobra ICP-RIE are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the PlasmaPro 100 Cobra ICP-RIE is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]PlasmaPro 100 Cobra ICP-RIE – Nano Vacuum Pty Ltd — nanovactech.comnanovactech.com
- [3]Learn all about the 'PlasmaPro 100 Cobra ICP-RIE', by Oxford Instruments! The PlasmaPro 100 Cobra ICP RIE system utilises a high-density inductively coupled plasma to achieve fast etch rates. The process modules offer excellent uniformity, high-throughput, high-precision and low-damage processes for wafer sizes up to 200mm, supporting a number of markets including, GaAs & InP laser optoelectronics, SiC & GaN power electronics/RF and MEMS & sensors. More Here: https://bit.ly/3Rxi9F0 #plasma #2Dmaterials #photonics #spintronics #quantumcomputing #nanofabrication #nanovacuum #OxfordInstruments | Nano Vacuum — facebook.comfacebook.com
- [4]Equipment Capabilities - Electrical & Computer Engineering — ece.utoronto.caece.utoronto.ca
Last updated Jul 29, 2026.