Waferpedia

Tool family

Ulvac NE 950

UlvacEtch2 entries
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Models in this family

  1. NE 950 EX ICP

    The Ulvac NE 950 EX ICP is an inductively coupled plasma etcher.

  2. NE 950 ICP-RIE

    The Ulvac NE 950 is an ICP-RIE (Inductively Coupled Plasma - Reactive Ion Etch) system with a chamber described for 2" to 12" wafers.

All entries

  1. NE 950 EX ICPUlvac

    The Ulvac NE 950 EX ICP is an inductively coupled plasma etcher.

    CategoryEtchWaferWafer end effector
    9 specs
  2. NE 950 ICP-RIEUlvac

    The Ulvac NE 950 is an ICP-RIE (Inductively Coupled Plasma - Reactive Ion Etch) system with a chamber described for 2" to 12" wafers.

    CategoryEtch
    20 specs