Waferpedia

Manufacturer

Ulvac

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62 entries

  1. Heliot 700 Helium Leak DetectorUlvac
  2. EX 550 C 12 VaporUlvac
    CategoryDeposition
  3. 711 w 1 Leak detectorUlvac
  4. NE 5700Ulvac
    CategoryEtch
  5. Entron EXUlvac
    CategoryDeposition
  6. PDR 090 B DryUlvac

    The Ulvac PDR 090 B is a dry pump.

  7. Ei 7 K VacuumUlvac
    CategoryDeposition
  8. SME 200 JUlvac

    The Ulvac SME 200 J is a sputtering system.

    CategoryDeposition
  9. SIV 500 ITOUlvac

    The Ulvac SIV 500 ITO is a sputtering system.

    CategoryDeposition
  10. SRH 420Ulvac
  11. EX 550 C 10 VaporUlvac
    CategoryDeposition
  12. SRH 530Ulvac
    CategoryDeposition
  13. NE 550 EX DryUlvac
    CategoryEtch
  14. CRYO U 8 HL CryopumpUlvac

    The Ulvac CRYO U 8 HL is a cryopump with a 9.5-inch outer diameter and an 8.375-inch inner diameter ISO flange.

  15. PRC 012 AS DryUlvac
  16. NE 700 DryUlvac
    CategoryEtch
  17. Enviro IIUlvac
  18. NE 950Ulvac
    CategoryEtch
  19. NE 5500Ulvac
    CategoryEtch
  20. CME 200 JUlvac
    CategoryDeposition
  21. SIV 200Ulvac
  22. CV 200Ulvac
    CategoryDeposition
  23. EBX 8 CUlvac
    CategoryDeposition
  24. EBX 10 C High Vacuum EvaporationUlvac
    CategoryDeposition
  25. EBX 2000 High Vacuum EvaporationUlvac
    CategoryDeposition
  26. SRH 420 MC BacksideUlvac
    CategoryDeposition
  27. Ceraus Z 1101Ulvac
    CategoryDeposition
  28. Entron EX W 300Ulvac
    CategoryDeposition
  29. Enviro Advanced StripUlvac
  30. Enviro Downstream MicrowaveUlvac
  31. EBX 1000 C VaporUlvac
    CategoryDeposition
  32. U 12 CryopumpUlvac
  33. U 22 CryopumpUlvac

    The Ulvac U 22 is a cryopump.

  34. U 9 CryopumpUlvac
  35. LR 3600 DryUlvac
  36. SME 200 Pt PlatinumUlvac
    CategoryDeposition
  37. Ceraus ZX 1000Ulvac
    CategoryDeposition
  38. SOPHI 200Ulvac
  39. 1200 IISUlvac
  40. NE 950 EX ICPUlvac

    The Ulvac NE 950 EX ICP is an inductively coupled plasma etcher.

    CategoryEtchWaferWafer end effector
  41. Phi Adept 1010 Automated Depth ProfilingUlvac
  42. Ei 7 L E-BeamUlvac

    The Ulvac Ei 7 L is an e-beam evaporator with an auto loader, wafer transfer system, load lock chamber, process chamber, and operation panel, designed for depositing metals such as Al, Ni, Ti, Pt, and Au.

    CategoryDepositionWaferAuto loader (EFEM), wafer transfer system, load lock chamber, process chamber, operation panel.
  43. SMD 450Ulvac
    CategoryDeposition
  44. C 30 B Cryo CompressorUlvac
  45. RFS 2780Ulvac
  46. NE 950 EXUlvac
    CategoryEtch
  47. SIV 200 ITOUlvac

    The Ulvac SIV 200 ITO is a sputtering system.

    CategoryDeposition
  48. IPZ 9001Ulvac
    CategoryIon Implantation
  49. CRYO U 10 HL CryopumpUlvac
  50. Ei 5 AuUlvac
    CategoryDeposition
  51. UNECS-2000Ulvac

    The ULVAC UNECS-2000 is a spectroscopic ellipsometer used to measure refractive index and thin-film thickness.

    CategoryMeasurement
  52. NE 5000 NUlvac

    The Ulvac NE 5000 N is an etcher described with 6-inch wafer size, helium cooling, auto loading and unloading, and uniformity of +/- 3%.

    CategoryEtch
  53. G 50 D Rotary VacuumUlvac

    The Ulvac G 50 D is a two-stage rotary vacuum pump rated for 50/60 Hz.

  54. SME 200Ulvac
    CategoryDeposition
  55. Heliot 701 Helium Leak DetectorUlvac

    The Ulvac Heliot 701 is a helium leak detector.

  56. SIV 500Ulvac
    CategoryDeposition
  57. EBX 1000 High Vacuum EvaporationUlvac

    The Ulvac EBX 1000 is a high vacuum evaporation system.

    CategoryDeposition
  58. SOPHI 200 IonUlvac
    CategoryIon Implantation
  59. Ei 5Ulvac
    CategoryDeposition
  60. NE-550Ulvac

    The Ulvac NE-550 is a multipurpose high-density, low-pressure plasma etching system used for chlorine etching.

    CategoryEtch