Manufacturer
Ulvac
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62 entries
- UNECS-2000Ulvac
The ULVAC UNECS-2000 is a spectroscopic ellipsometer used to measure refractive index and thin-film thickness.
CategoryMeasurement - SRH 420 MC BacksideUlvacCategoryDeposition
- NE 5500Ulvac
The Ulvac NE 5500 is an etch tool used in semiconductor manufacturing.
CategoryEtch - NE 950 EX ICPUlvac
The Ulvac NE 950 EX ICP is an inductively coupled plasma etcher.
CategoryEtchWaferWafer end effector - CME 200 JUlvac
The Ulvac CME 200 J is a plasma-enhanced chemical vapor deposition (PECVD) system.
CategoryDeposition - Ei 7 K VacuumUlvacCategoryDeposition
- EBX 2000 High Vacuum EvaporationUlvac
The Ulvac EBX 2000 is a high vacuum evaporation system manufactured by Ulvac, with a reported vintage of 2005.
CategoryDeposition - EBX 10 C High Vacuum EvaporationUlvacCategoryDeposition
- SRH 420Ulvac
- 711 w 1 Leak detectorUlvac
- SIV 200Ulvac
- EX 550 C 12 VaporUlvac
The Ulvac EX 550 C 12 Vapor is a vapor deposition system that accepts 6-inch wafers.
CategoryDeposition - SRH 530UlvacCategoryDeposition
- Ei 5 AuUlvac
The Ulvac Ei 5 Au is an evaporator in the deposition category.
CategoryDeposition - SIV 200 ITOUlvac
The Ulvac SIV 200 ITO is a sputtering system.
CategoryDeposition - Enviro IIUlvac
- EBX 1000 C VaporUlvac
The Ulvac EBX 1000 C is a vapor deposition tool for 6-inch wafers.
CategoryDeposition - SIV 500 ITOUlvac
The Ulvac SIV 500 ITO is a sputtering system.
CategoryDeposition - EX 550 C 10 VaporUlvacCategoryDeposition
- NE 550 EX DryUlvac
The Ulvac NE 550 EX is a dry etcher that handles 4 inch wafers.
CategoryEtch - CV 200Ulvac
The Ulvac CV 200 is a physical vapor deposition (PVD) sputter system.
CategoryDeposition - PRC 012 AS DryUlvac
The Ulvac PRC 012 AS Dry is a dry pump in the Lab & Support Equipment category.
CategoryLab & Support Equipment - NE 700 DryUlvac
The Ulvac NE 700 Dry is a dry etcher manufactured by Ulvac and categorized as an Etch tool.
CategoryEtch - Heliot 700 Helium Leak DetectorUlvac
The Ulvac Heliot 700 Helium Leak Detector is a helium leak detector manufactured by ULVAC of Japan.
- SOPHI 200Ulvac
The Ulvac SOPHI 200 Ion is an ion implantation tool family entry with one documented model, SOPHI 200 Ion.
- EBX 8 CUlvacCategoryDeposition
- U 12 CryopumpUlvac
The Ulvac U 12 Cryopump is a cryopump identified by model U 12.
- PDR 090 B DryUlvac
The Ulvac PDR 090 B is a dry pump.
CategoryLab & Support Equipment - Enviro Advanced StripUlvac
The Ulvac Enviro Advanced Strip is an equipment model from Ulvac for which no technical specifications are publicly documented.
- SME 200 Pt PlatinumUlvac
The Ulvac SME 200 Pt Platinum is a sputter deposition system.
CategoryDeposition - U 9 CryopumpUlvac
The Ulvac U 9 Cryopump is a cryopump manufactured by Ulvac.
- LR 3600 DryUlvac
The Ulvac LR 3600 Dry is a dry pump manufactured by Ulvac.
- Entron EXUlvacCategoryDeposition
- 1200 IISUlvac
The Ulvac 1200 IIS is a semiconductor manufacturing tool by Ulvac, documented in equipment inventory listings.
- SME 200 JUlvac
The Ulvac SME 200 J is a sputtering system.
CategoryDeposition - Phi Adept 1010 Automated Depth ProfilingUlvac
- SME 200Ulvac
The Ulvac SME 200 is a sputtering system used for thin film deposition.
CategoryDeposition - Enviro Downstream MicrowaveUlvac
The Ulvac Enviro Downstream Microwave Asher is a single-chamber advanced strip system with an ENI OEM-6B RF generator, five MFCs, a Brooks robot, and an Edwards IQ pump/blower.
- SIV 500Ulvac
The Ulvac SIV 500 is an in-line sputtering system used for thin-film deposition, including indium tin oxide (ITO).
CategoryDeposition - Ceraus ZX 1000Ulvac
The Ulvac Ceraus ZX 1000 is a PVD (Physical Vapor Deposition) system that handles 8 inch wafers.
CategoryDeposition - Ceraus Z 1101Ulvac
The Ulvac Ceraus Z 1101 is a physical vapor deposition (PVD) system that processes 6 inch wafers.
CategoryDeposition - NE 950Ulvac
The Ulvac NE 950 is an ICP-RIE etch system with a chamber described for 2" to 12" wafers.
CategoryEtch - SOPHI 200 IonUlvac
The Ulvac SOPHI 200 Ion is an ion implanter in the Ion Implantation category.
CategoryIon Implantation - SMD 450Ulvac
The Ulvac SMD 450 is a sputtering system in the deposition category.
CategoryDeposition - RFS 2780Ulvac
The Ulvac RFS 2780 is an RF generator.
- NE 950 EXUlvacCategoryEtch
- Entron EX W 300Ulvac
The Ulvac Entron EX W 300 is a PVD (Physical Vapor Deposition) system manufactured by Ulvac.
CategoryDeposition - NE 5700Ulvac
The Ulvac NE 5700 is a dry etching system for production use, configured as a 200mm cluster tool with up to two process chambers.
CategoryEtchWaferWafer Equipment - CRYO U 8 HL CryopumpUlvac
The Ulvac CRYO U 8 HL is a cryopump with a 9.5-inch outer diameter and an 8.375-inch inner diameter ISO flange.
- CRYO U 10 HL CryopumpUlvac
The Ulvac CRYO U 10 HL Cryopump is a cryopump made by Ulvac.
- Heliot 701 Helium Leak DetectorUlvac
The Ulvac Heliot 701 is a helium leak detector.
CategoryTest & Probe - Ei 5Ulvac
General referenceThe Ulvac Ei 5 is a deposition system. In general reference terms, machines in this class form thin films on substrate surfaces under controlled vacuum conditions as part of device, optics, and materials fabrication.
CategoryDeposition - EBX 1000 High Vacuum EvaporationUlvac
The Ulvac EBX 1000 is a high vacuum evaporation system.
CategoryDeposition - C 30 B Cryo CompressorUlvac
The Ulvac C 30 B Cryo Compressor is a cryogenic compressor used in vacuum and cooling applications.
- NE 5000 NUlvac
The Ulvac NE 5000 N is an etcher described with 6-inch wafer size, helium cooling, auto loading and unloading, and uniformity of +/- 3%.
CategoryEtch - NE 950 ICP-RIEUlvac
The Ulvac NE 950 is an ICP-RIE (Inductively Coupled Plasma - Reactive Ion Etch) system with a chamber described for 2" to 12" wafers.
CategoryEtchWaferφ2’ φ4’ φ6’ φ8’ Single Wafer Auto Transfer - G 50 D Rotary VacuumUlvac
The Ulvac G 50 D is a two-stage rotary vacuum pump rated for 50/60 Hz.
CategoryLab & Support Equipment - NE-550Ulvac
The Ulvac NE-550 is a multipurpose high-density, low-pressure plasma etching system used for chlorine etching.
CategoryEtch - SDP 570 VMS In LineUlvac
The Ulvac SDP 570 VMS In Line is a deposition sputtering tool with DC magnetron sputtering, manual substrate loading, and glass substrate handling.
CategoryDeposition - IPZ 9001Ulvac
The Ulvac IPZ 9001 is an ion implanter with a documented 6-inch wafer size.
CategoryIon Implantation
