Ulvac
NE 950 EX ICP
The Ulvac NE 950 EX is an inductively coupled plasma (ICP) etcher. The Ulvac NE 950 EX includes an atmospheric robot with dual end effectors, a carrier end effector, and a wafer end effector. The Ulvac NE 950 EX is controlled by a Toshiba FA2-100SS computer.[1]
What it is
The Ulvac NE 950 EX ICP is an inductively coupled plasma etcher.[1]
The Ulvac NE 950 EX ICP includes a loadlock and cassette stage module, a cassette load, a cassette aligner, a carrier load and aligner, an atmospheric robot with dual end effectors, a carrier end effector, a wafer end effector, and a transfer chamber.[1]
How it works
General reference — not yet source-verifiedAn inductively coupled plasma etcher uses a plasma source to generate reactive species that remove material from exposed areas of a wafer surface.
An etch tool in this class commonly combines wafer handling, wafer alignment, and a vacuum process chamber so the wafer can be moved from atmospheric loading into a controlled etch environment.
Where it fits in the process flow
General reference — not yet source-verifiedThe Ulvac NE 950 EX ICP fits in the etch portion of semiconductor manufacturing, where patterned films are selectively removed after lithography defines the areas to be opened.
Applications
General reference — not yet source-verifiedICP etchers are used for anisotropic removal of thin films and for pattern transfer in microfabrication.
The Ulvac NE 950 EX ICP is suited to wafer-level plasma etch processing in semiconductor device fabrication.
What do the numbers mean?
Wafer handling8
- Cassette Load[1]
- Cassette aligner[1]
- Carrier Load / Aligner[1]
- Atmospheric Robot ith dual end effectors[1]
- Carrier End effector[1]
- Transfer chamber[1]
- System modules
- Loadlock & cassette stage module, cassette load, cassette aligner, carrier load/aligner, atmospheric robot with dual end effectors, carrier end effector, wafer end effector, transfer chamber[1]
Control & software3
Configuration & options4
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the NE 950 EX ICP are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the NE 950 EX ICP are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the NE 950 EX ICP are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the NE 950 EX ICP are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the NE 950 EX ICP are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the NE 950 EX ICP is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]Inventory photo
Last updated Oct 13, 2026.
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