Ulvac

Wafer size
φ2’ φ4’ φ6’ φ8’ Single Wafer Auto Transfer
Power
RF System:[1]
Vacuum
Pressure Control:[1]
Gas delivery
Gas Box:[1]
The NE 950 employs two AD-TEC AX-1000 RF generators, one for the ICP source and one for the bias. The system includes two matchboxes: an AMV-1000-12.5M-CT and an AMV-1000-AV3. Pressure is regulated by an MKS T3PIA valve and MKS E28D gauge. The vacuum system uses a Shimadzu TMP-2203LMTG turbo pump.[1]
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The following facts about the NE 950 ICP-RIE are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the NE 950 ICP-RIE are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the NE 950 ICP-RIE are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the NE 950 ICP-RIE are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the NE 950 ICP-RIE are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the NE 950 ICP-RIE is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 13, 2026.
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