Waferpedia

Ulvac

NE 950 ICP-RIE

EtchUlvac NE 950 family
Research Quality: 30% complete
NE 950 ICP-RIE — Inventory photo
Fig. 01NE 950 ICP-RIEInventory photo[1]

Power

RF System:[1]

Vacuum

Pressure Control:[1]

Gas delivery

Gas Box:[1]

What is it?

The Ulvac NE 950 is an ICP-RIE (Inductively Coupled Plasma - Reactive Ion Etch) system with a chamber described for 2" to 12" wafers.

What do the numbers mean?

Power & electrical3

RF System:[1]
Accurate?
RF Generator 1: AX-1000 (AD-TEC)[1]
Accurate?
RF Generator 2: AX-1000 (AD-TEC)[1]
Accurate?

Vacuum & pumping2

Pressure Control:[1]
Accurate?
Turbo Pump:[1]
Accurate?

Wafer handling1

Chuck φ 305mm(φ2’ φ4’ φ6’ φ8’)[1]
Accurate?

Gas & chemistry8

Gas Box:[1]
Accurate?
Gas 1 Horiba STEC SEC-E40 Ar
100SCCM[1]
Accurate?
Gas 2 Horiba STEC SEC-E40 O2
100SCCM[1]
Accurate?
Gas 3 Horiba STEC SEC-E40 CHF3
100SCCM[1]
Accurate?
Gas 4 Horiba STEC SEC-E440J BCL3 200SCCM[1]
Accurate?
Gas 5 Horiba STEC SEC-E440J CL2 200SCCM[1]
Accurate?
Gas 6 Horiba STEC SEC-E440J SiCL4 200SCCM[1]
Accurate?
Cooling Gas
MKS 649A 50SCCM[1]
Accurate?

Control & software1

MKS Valve Control[1]
Accurate?

Configuration & options5

Chamber:[1]
Accurate?
Match Box 1
AMV-1000-12.5M-CT[1]
Accurate?
Match Box 2
AMV-1000-AV3[1]
Accurate?
Valve
MKS T3PIA 26696[1]
Accurate?
Gauge
MKS E28D[1]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • ConfigurationGas Box:[1]
  • Gas 1 Horiba STEC SEC-E40 Ar100SCCM[1]
  • Gas 2 Horiba STEC SEC-E40 O2100SCCM[1]
  • Gas 3 Horiba STEC SEC-E40 CHF3100SCCM[1]
  • ConfigurationGas 4 Horiba STEC SEC-E440J BCL3 200SCCM[1]
  • ConfigurationGas 5 Horiba STEC SEC-E440J CL2 200SCCM[1]
  • ConfigurationGas 6 Horiba STEC SEC-E440J SiCL4 200SCCM[1]
  • Cooling GasMKS 649A 50SCCM[1]
  • ConfigurationRF System:[1]
  • ConfigurationRF Generator 1: AX-1000 (AD-TEC)[1]
  • ConfigurationRF Generator 2: AX-1000 (AD-TEC)[1]
  • ConfigurationPressure Control:[1]
  • ConfigurationTurbo Pump:[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Not publicly documented

The following facts about the NE 950 ICP-RIE are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the NE 950 ICP-RIE are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the NE 950 ICP-RIE are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the NE 950 ICP-RIE are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the NE 950 ICP-RIE are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the NE 950 ICP-RIE is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (1)Every fact above is drawn from these public sources
  1. [1]Inventory photo
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Last updated Jul 29, 2026.

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