Raith

EBPG5000

Lithography 150mmsub-10 nmRaith EBPG5000 family

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EBPG5000 — epfl.ch — Fig. 01EBPG5000epfl.ch^[1]

Plate 01Finishing the E-Beam Process on a Raith EBPG 5000+ (Live Streamed)
OnripresenceWatch on YouTube

Wafer size

150mm

Node / era

sub-10 nm

Power

50 MHz^[1]

Optics

smaller than 10 nm features^[1]

What is it?

Sources describe the Raith EBPG5000 as an ebeam lithography tool/system. One source states the EBPG5000ES system at CMi is capable of writing smaller than 10 nm features and placing structures with less than 20 nm accuracy, and lists a 100 keV thermal field emission gun, Gaussian beam, 50 MHz pattern generator, direct-write mark detection and alignment software, and holders for 50 mm, 100 mm, and 150 mm wafers, plus 5-inch masks and smaller piece parts. Another source describes a Raith EBPG5200 E-beam lithography system used chiefly for write lithography and R&D mask making and gives features including 155 mm writing capability, wafer sizes up to 6 inches, and a minimum feature size of less than 8 nm.

What can it run?

Process applications and technology nodes documented for this tool.

Write lithography
R&D mask making
Compound semiconductor application
Vertical resonant tunnel transistor
Circular grating resonator

What do the numbers mean?

Power & electrical2

Pattern generator: 50 MHz^[1]
Pattern generator: 50 / 100 MHz^[2]

Wafer handling2

Wafer holders: 50 mm, 100 mm, and 150 mm wafers^[1]
Maximum wafer size: up to 6 inches^[2]

Optics & imaging5

Feature capability: smaller than 10 nm features^[1]
Placement accuracy: less than 20 nm^[1]
Mask holders: 5 inch masks and smaller piece parts^[1]
Maximum mask size: up to 6 inches^[2]
Minimum feature size: less than 8 nm^[2]

Performance1

Alignment: direct write mark detection and alignment software^[1]

Configuration & options6

Tool type: Ebeam lithography tool/system^[1]
Electron gun: 100 keV thermal field emission gun^[1]
Beam type: Gaussian beam^[1]
Writing capability: 155 mm^[2]
Electron gun: thermal field emission gun, for operation at 20, 50, and 100 kV^[2]
Field size: variable field size to 1 mm at all kVs^[2]

Interested in this tool?

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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

Pattern generator50 MHz^[1]
Pattern generator50 / 100 MHz^[2]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Not publicly documented

The following facts about the EBPG5000 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the EBPG5000 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the EBPG5000 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the EBPG5000 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the EBPG5000 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
No publicly documented compatible parts, consumables, or accessories for the EBPG5000 are on record.
Answerable by: an OEM parts catalog or a service engineer

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (3)Every fact above is drawn from these public sources

[1]epfl.ch — epfl.chepfl.ch
[2]pnf.uchicago.edu — pnf.uchicago.edupnf.uchicago.edu
[3]Toronto Nanofabrication Centre (TNFC) - Electrical & Computer Engineering — ece.utoronto.caece.utoronto.ca

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Last updated Jul 29, 2026.

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