ABM
Mask
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The ABM Mask is a manual mask aligner with top-side alignment and substrate capabilities from 100 mm down to small pieces. The ABM Mask is used primarily for SU8 exposure. The ABM Mask uses a 1000 Watt DUV light source.[1][2]
Power
Using 1000 Watt DUV light source[2]
Vacuum
Flood, soft, hard, and vacuum contact[3]
Performance
top-side alignment[1]
Optics
Can handle mask size up to 5"[2]
What it is
How it works
The ABM contact aligner supports vacuum, soft, hard, and flood exposure methods, and it includes auto-Z planarization, wedge compensation, and chuck leveling.[3]
Where it fits in the process flow
The ABM Mask Aligner is used for ultraviolet exposure in resist patterning, and one site also uses it for aligning PDMS components for PDMS-to-PDMS bonding.[1]
Applications
Why won't it start?
Documented failure modes, common issues, and field considerations.
- The inspection microscope light source potentiometer is described as touchy.
- The set knob is described as having a decaying sensor.
What do the numbers mean?
Power & electrical2
- Using 1000 Watt DUV light source[2]
Vacuum & pumping1
Wafer handling3
Optics & imaging9
- Can handle mask size up to 5"[2]
Performance1
Control & software1
- The controller Box was recently refurbished[2]
Configuration & options3
Vintage & configurations
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| ABM3000HR Mask Aligner | — | — | Manual mask aligner with top-side alignment and substrate capability from 100 mm down to small pieces; requires a 5 inch mask or 5 inch glass plate with film mask. | wiki.nano.upenn.edu[1] |
| ABM Mask Contact Aligner | — | — | Supports front-side and backside alignment, exposure methods including flood, soft, hard, and vacuum contact, and substrates up to 150 mm diameter. | nist.gov[3] |
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What substrate sizes does the ABM Mask Contact Aligner support?
The ABM Mask Contact Aligner supports substrates from 150 mm diameter wafers down to small pieces.[3]
What exposure modes does the ABM Mask Contact Aligner offer?
The ABM Mask Contact Aligner offers vacuum, soft, hard, and flood exposure methods.[3]
What wavelengths does the ABM Mask Contact Aligner use?
The ABM Mask Contact Aligner uses exposure wavelengths from 365 nm to 400 nm and includes 220 nm and 254 nm wavelength filters.[3]
Not publicly documented
The following facts about the Mask are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Mask are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the Mask are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the Mask is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the Mask are on record.
Answerable by: an OEM parts catalog or a service engineer
No publicly hosted manuals, SOPs, or datasheets for the Mask are on record.
Answerable by: university cleanroom staff or an OEM application specialist
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]wiki.nano.upenn.edu — wiki.nano.upenn.eduwiki.nano.upenn.edu
- [2]Inventory photo
- [3]nist.gov — nist.govnist.gov
- [4]Equipment Resources | CNF — cnf.cornell.educnf.cornell.edu
Last updated Oct 13, 2026.
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