Waferpedia

Advantest

F 5112 E-Beam Lithography

F 5112 E-Beam Lithography — Inventory photo
Fig. 01F 5112 E-Beam LithographyInventory photo[1]

Power

50 kV[2]

Optics

45 nm[2]

What is it?

The Advantest F 5112 is an e-beam lithography system specified for 3-inch wafers.

What do the numbers mean?

Power & electrical3

Accelaration voltage
50 kV[2]
Accurate?
Scanning speed
8 MHz[2]
Accurate?
50/60 Hz[1]
Accurate?

Optics & imaging2

Stitching accuracy
45 nm[2]
Accurate?
Overlay accuracy
45 nm[2]
Accurate?

Configuration & options3

Field size
1600 μm x800 μm[2]
Accurate?
Beam current
3.5 μA[2]
Accurate?
Beam size
4 μm x4 μm variable shaped beam[2]
Accurate?
Interested in this tool?
Embed spec card

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Accelaration voltage50 kV[2]
  • Scanning speed8 MHz[2]
  • Configuration50/60 Hz[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Not publicly documented

The following facts about the F 5112 E-Beam Lithography are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the F 5112 E-Beam Lithography are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the F 5112 E-Beam Lithography are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the F 5112 E-Beam Lithography are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the F 5112 E-Beam Lithography are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the F 5112 E-Beam Lithography is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (3)Every fact above is drawn from these public sources
  1. [1]Inventory photo
  2. [2]inventory listing
  3. [3]Products - ADVANTEST CORPORATIONadvantest.co.jp (Feb 5, 2012)web.archive.org
Was this page accurate?

Last updated Jul 29, 2026.

Compare with similar tools

View all →