Applied Materials

9500 Ion

Ion Implantation Wafer orientor Applied Materials PI 9500 family

Research Quality: 40% complete

The Applied Materials 9500 Ion Implanter is a semiconductor ion implantation tool designed for 6-inch wafers. The 9500 Ion Implanter features a Bernas ion source and a variable tilt angle of 0-7 degrees. The 9500 Ion Implanter includes a wafer orientor and SECS/GEM interface.^[1]^[2]

9500 Ion — Inventory photo — Fig. 019500 IonInventory photo^[1]

Wafer size

Wafer orientor

Power

60 Hz^[1]

Vacuum

Seiko Seiki^[1]

Gas delivery

Boron^[1]

How it works

The 9500 uses a Bernas-type ion source. The extraction system is a single bellows design. The implanter supports a variable tilt angle from zero to seven degrees. The beamline is of standard configuration. A plasma flood system (HDPFS) is present for charge neutralization. The machine includes a wafer orientor and a factory interface supporting SECS/GEM protocol.^[1]^[2]

What do the numbers mean?

Power & electrical4

Frequency: 60 Hz^[1]
Line Frequency: 60 Hz^[2]
Line Frequency (Source 2): 60 Hz^[2]
Hydrogen Generator: No^[2]

Vacuum & pumping10

Turbo pumps type: Seiko Seiki^[1]
Mech pumps type: Edwards^[1]
Cryo pumps type: Cryotorr^[1]
Turbo Pump Type: Seiko Seiki^[1]
Mech Pump Type: Edwards^[1]
Cryo Pump Type: Cryotorr^[1]
Turbo Pump Type (Source 2): Leybold^[2]
Mech Pump Type (Source 2): Edwards^[2]
Cryo Pump Type (Source 2): CTI Helix Onboard^[2]
Auto Cryo Purge: No^[2]

Wafer handling10

Wafer cassette: 25 wafers^[1]
Wafer size: Wafer orientor^[1]
Wafer Fittings: Imperial^[2]
Wafer Size: 6 inch^[1]
Wafer Cassette Capacity: 25 wafers^[1]
Wafer Orientor: Yes^[1]
Wafer Size (Source 2): 6 inch^[2]
Wafer Cassette Capacity (Source 2): 25 wafers^[2]
Wafer Orienter (Source 2): Yes^[2]
Wafer Size (Source 3): 200mm^[3]

Gas & chemistry9

Gas Position 1: Boron^[1]
Gas Position 2: N/A^[1]
Gas Position 3: Available SDS^[1]
Gas Position 4: Arsine^[1]
Gas Position 1 (Source 2): N/A^[2]
Gas Position 2 (Source 2): N/A^[2]
Gas Position 3 (Source 2): Phosphine^[2]
Gas Position 4 (Source 2): Arsine^[2]
Toxic Gas Alarm: No^[2]

Control & software1

Factory interface: SECS/GEM^[1]

Configuration & options39

Water fittings: Imperial^[1]
Remote distance: ~6m umbilical^[1]
Layout: Thru wall^[1]
Second compressor: 9600 (qty 2)^[1]
Helium line length: 15 m^[1]; RGA^[1]
Tilt angle: Variable 0-7^[1]
Wheel type: Standard^[1]
Beamstop: Enlarged Beam Stop^[1]
Plasma Flood System: HDPFS^[1]
Beamline: Standard^[1]
Source type: Bernas^[1]
Front plate: Tungsten^[1]
Utilities: Top^[2]
Remote Distance: 6 m umbilical^[2]
Tilt Angle: Variable 0-7 degrees^[1]
Front Plate Material: Tungsten^[1]
Extraction Type: Single bellows^[1]
TEM: No^[1]
Source Chamber Liners: Yes^[1]
MRS Chamber Liners: Yes^[1]
TFT Monitor Upgrade: Yes^[1]
RGA: Yes^[1]
Tilt Angle (Source 2): Variable 0-7 degrees^[2]
Wheel Type (Source 2): Standard^[2]
Source Type (Source 2): Bernas^[2]
Front Plate Material (Source 2): Tungsten^[2]
Extraction Type (Source 2): Single Bellows^[2]
Source Chamber Liners (Source 2): Yes^[2]
MRS Chamber Liners (Source 2): Yes^[2]
TFT Monitor Upgrade (Source 2): Yes^[2]
RGA (Source 2): No^[2]
Remote Distance (Source 2): 6 m umbilical^[2]
Layout (Source 2): Through wall^[2]
Second Compressor (Source 2): Yes 9600 (2)^[2]
Helium Line Length (Source 2): 15 m^[2]
Vaporizers: No^[2]
VESDA: No^[2]
Description (Source 3): Ion Implanter (High Current)^[3]

Vintage & configurations

1993-06-01Vintage^[3]
Manufacture date for a specific unit (PI-9500 variant)

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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

Frequency60 Hz^[1]
Turbo pumps typeSeiko Seiki^[1]
Mech pumps typeEdwards^[1]
Cryo pumps typeCryotorr^[1]
Line Frequency60 Hz^[2]
Gas Position 1Boron^[1]
Gas Position 2N/A^[1]
Gas Position 3Available SDS^[1]
Gas Position 4Arsine^[1]
Turbo Pump TypeSeiko Seiki^[1]
Mech Pump TypeEdwards^[1]
Cryo Pump TypeCryotorr^[1]
Gas Position 1 (Source 2)N/A^[2]
Gas Position 2 (Source 2)N/A^[2]
Gas Position 3 (Source 2)Phosphine^[2]
Gas Position 4 (Source 2)Arsine^[2]
Line Frequency (Source 2)60 Hz^[2]
Turbo Pump Type (Source 2)Leybold^[2]
Mech Pump Type (Source 2)Edwards^[2]
Cryo Pump Type (Source 2)CTI Helix Onboard^[2]
Hydrogen GeneratorNo^[2]
Toxic Gas AlarmNo^[2]
Auto Cryo PurgeNo^[2]

Where are the manuals?

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Not publicly documented

Field notes

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Not publicly documented

The following facts about the 9500 Ion are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

No publicly documented variants, configuration options, or revision breakpoints of the 9500 Ion are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 9500 Ion are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 9500 Ion are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 9500 Ion is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the 9500 Ion are on record.
Answerable by: an OEM parts catalog or a service engineer