Applied Materials
Centura 5200 DPS
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
Produced
1995–
Power
50/60 Hz[1]
What it is
General reference — not yet source-verifiedAn etch system is semiconductor manufacturing equipment that removes selected material from a wafer after lithographic patterning. A plasma etcher transfers patterns by exposing the wafer to reactive species formed in a controlled process chamber.
How it works
The Applied Materials Centura 5200 DPS uses a decoupled plasma source architecture.[1]
Where it fits in the process flow
General reference — not yet source-verifiedPlasma etch equipment is used after a patterned resist or hard mask defines the areas to be opened on the wafer. Plasma etch equipment is followed by steps such as resist removal, cleaning, inspection, and the next deposition or implantation operation, depending on the device flow.
Applications
General reference — not yet source-verifiedPlasma etch systems are used to pattern films that form device features and interconnect structures. Plasma etch systems are applied where anisotropic material removal and controlled feature transfer are required in semiconductor fabrication.
What do the numbers mean?
Power & electrical3
- 50/60 Hz[1]
Wafer handling2
Configuration & options10
- 4 Chamber[1]
Vintage & configurations
- 1995Production start[1]
1995 vintage indicates production or introduction year.
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the Centura 5200 DPS are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented variants, configuration options, or revision breakpoints of the Centura 5200 DPS are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Centura 5200 DPS are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Centura 5200 DPS are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Centura 5200 DPS is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the Centura 5200 DPS are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (1)Every fact above is drawn from these public sources
- [1]Equipment inventory listing
Last updated Oct 17, 2026.
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