Waferpedia

Tool family

Applied Materials Centura 5200

Applied Materials15 entries

Models in this family

  1. Cited variants

    DesignationGenerationVintageChangesSource
    Centura 5200 PECVDPECVD configuration; source states 8-inch wafers and lists associated chamber and subsystem details.Equipment inventory listing[1]
    Centura 5200 CVDCVD configuration.Equipment inventory listing[2]
  2. Applied Materials Centura 5200 DPS is a decoupled plasma source system described as a 4-chamber tool for 8-inch wafers.

  3. Applied Materials Centura 5200 EPI Reactor is an epitaxial reactor configured with three atmospheric epi chambers and one cool-down chamber.

  4. The Applied Materials Centura 5200 ES MxP Poly is an etch system that handles 8-inch wafers.

  5. Applied Materials Centura 5200 HTF EPI is an epitaxial silicon deposition system for 8-inch wafers.

    Cited variants

    DesignationGenerationVintageChangesSource
    Applied Materials Centura 5200 HTF EPIEquipment inventory listing[3]
  6. Applied Materials Centura 5200 HTF RP EPI is a reduced-pressure epitaxial silicon deposition system.

  7. The Applied Materials Centura 5200 Mainframe is a semiconductor wafer processing platform used in fabrication facilities.

  8. Applied Materials Centura 5200 Metal is a CVD deposition system stated to support 8-inch wafers.

  9. Cited variants

    DesignationGenerationVintageChangesSource
    Centura 5200 MxP ChamberDescribed as an MxP Etching Chamber with 200 mm version.fabsurplus.com[4]
  10. Cited variants

    DesignationGenerationVintageChangesSource
    Centura 5200 WXZ Metal CVDEquipment inventory listing[5]

All entries

  1. Centura 5200Applied Materials
    CategoryDeposition
    16 specs
  2. Centura 5200 DielectricApplied Materials
    CategoryEtch
    1 spec
  3. Centura 5200 DPSApplied Materials

    Applied Materials Centura 5200 DPS is a decoupled plasma source system described as a 4-chamber tool for 8-inch wafers.

    3 specs
  4. Centura 5200 DryApplied Materials
    CategoryEtch
    3 specs
  5. Centura 5200 EPI ReactorApplied Materials

    Applied Materials Centura 5200 EPI Reactor is an epitaxial reactor configured with three atmospheric epi chambers and one cool-down chamber.

    13 specs
  6. Centura 5200 ES MxP PolyApplied Materials

    The Applied Materials Centura 5200 ES MxP Poly is an etch system that handles 8-inch wafers.

    CategoryEtch
    4 specs
  7. Centura 5200 High KApplied Materials
    4 specs
  8. Centura 5200 HTF EPIApplied Materials

    Applied Materials Centura 5200 HTF EPI is an epitaxial silicon deposition system for 8-inch wafers.

    CategoryDeposition
    2 specs
  9. Centura 5200 HTF RP EPIApplied Materials

    Applied Materials Centura 5200 HTF RP EPI is a reduced-pressure epitaxial silicon deposition system.

    CategoryDeposition
    2 specs
  10. Centura 5200 MainframeApplied Materials

    The Applied Materials Centura 5200 Mainframe is a semiconductor wafer processing platform used in fabrication facilities.

    1 spec
  11. Centura 5200 MetalApplied Materials

    Applied Materials Centura 5200 Metal is a CVD deposition system stated to support 8-inch wafers.

    CategoryDeposition
    1 spec
  12. Centura 5200 MXP+Applied Materials
    CategoryEtch
    13 specs
  13. Centura 5200 MXP+ TungstenApplied Materials
    CategoryEtch
    2 specs
  14. Centura 5200 WXZApplied Materials
    3 specs
  15. Centura 5200 WXZ MetalApplied Materials
    CategoryDeposition
    1 spec

Sources

Sources (5)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]Equipment inventory listing
  3. [3]Equipment inventory listing
  4. [4]fabsurplus.comfabsurplus.com
  5. [5]Equipment inventory listing