Applied Materials
Centura II DPS Poly Dry
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
How it works
General reference — not yet source-verifiedA dry etch cluster tool uses vacuum process chambers and plasma-based material removal to pattern films on semiconductor wafers.
A poly dry etch tool is used to remove polysilicon selectively in a fabrication sequence after mask definition and before later integration steps.
Where it fits in the process flow
General reference — not yet source-verifiedThe Centura II DPS Poly Dry Etch fits in the front-end wafer fabrication flow as a pattern-transfer tool for polysilicon features.
The Centura II DPS Poly Dry Etch follows lithographic patterning and precedes downstream cleaning, metrology, and subsequent layer processing.
Applications
What do the numbers mean?
No specifications recorded yet
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Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the Centura II DPS Poly Dry are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No specifications for the Centura II DPS Poly Dry are on record.
Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Centura II DPS Poly Dry are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Centura II DPS Poly Dry are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Centura II DPS Poly Dry are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Centura II DPS Poly Dry are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]Equipment inventory listing
- [2]Applied Materials Centura II DPS POLY Dry Etch Cluster tool with 3 X DPS for sale — fabsurplus.comfabsurplus.com
- [3]Applied Materials Centura II DPS Poly Dry Etch Cluster tool with 3x DPS for sale — fabsurplus.comfabsurplus.com
Last updated Aug 20, 2026.