Applied Materials
Reflexion
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Applied Materials Reflexion is a chemical mechanical polisher (CMP) for semiconductor wafer polishing. The Applied Materials Reflexion CMP is built for processing 12-inch wafers. Applied Materials Reflexion units were configured for processing materials such as dielectric and oxide, copper, and metals including cobalt.[1][2][3]
How it works
A chemical mechanical polishing apparatus uses a substrate carrier or polishing head to hold a substrate against a polishing pad mounted on a platen. A carrier assembly applies controllable pressure to the substrate against the polishing pad. An external driving force moves the polishing pad relative to the substrate. A chemical mechanical polishing apparatus disperses a polishing composition or slurry during polishing to provide both chemical activity and mechanical activity. The polishing motion generates heat at the wafer and pad interface.[5]
Where it fits in the process flow
Chemical mechanical polishing is used after film deposition and pattern formation have created excess topography on the wafer. Chemical mechanical polishing can remove deposited material above filled features and create an even surface for subsequent patterning processes. Chemical mechanical polishing also helps remove unwanted roughness, scratches, contaminated layers, and other surface defects from previously deposited material.[5]
What do the numbers mean?
Wafer handling2
Gas & chemistry3
Configuration & options8
Vintage & configurations
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| Reflexion LK | — | — | listed as a CMP system available from Applied Materials | patents.google.com[5] |
| Reflexion LK Prime | — | — | listed as a CMP system available from Applied Materials | patents.google.com[5] |
| Reflexion | — | — | Configured as 12" Dielectric, LK Oxide. | Equipment inventory listing[1] |
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- SCREEN AS 2000— Same function class: CMP, nullCompare in depthsource[5]
- Strasbaugh 6 EC— Same function class: CMP, nullCompare in depthsource[5]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the Reflexion are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Reflexion are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the Reflexion are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Reflexion are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Reflexion is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the Reflexion are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (5)Every fact above is drawn from these public sources
- [1]inventory listing
- [2]inventory listing
- [3]inventory listing
- [4]Inventory photo
- [5]patents.google.com — patents.google.compatents.google.com
Last updated Oct 16, 2026.
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