Falcon 200 ALB Wafer

Wafer inspection systems are fab metrology tools used to examine wafer surfaces and patterned layers for defects, anomalies, or process excursions. Wafer inspection systems generally support process monitoring by finding issues early so affected wafers or steps can be reviewed before more value is added downstream.

Wafer inspection systems commonly move wafers into an optical inspection position, illuminate the wafer, capture images or sensor data, and analyze the result for defects or pattern deviations. Wafer inspection systems often combine wafer handling, illumination, imaging electronics, and machine control into one platform. Wafer inspection systems commonly use optical subsystems and image processing to support review of surface condition and patterned features.

Wafer inspection systems are used between manufacturing steps to verify wafer condition after processes such as deposition, lithography, etch, clean, or planarization. Wafer inspection systems support inline monitoring and excursion control by checking wafers before the next process module or before more advanced review and analysis.

Wafer inspection systems are applied to defect monitoring, process characterization, yield learning, and routine production surveillance. Wafer inspection systems can be used wherever a fab needs to screen wafers for particles, pattern issues, contamination, or other visible process-related defects.