Canon
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The Canon FPA 3030 i 5+ Fine Pattern is a semiconductor lithography stepper. The Canon FPA 3030 i 5+ Fine Pattern uses an i-line (365 nm) source. The Canon FPA 3030 i 5+ Fine Pattern is specified with 350 nm resolution, a 5:1 reduction ratio, and a 22 mm x 22 mm field size.[1][2]

The Canon FPA 3030 i 5+ uses a 5:1 reduction ratio and a field size of 22 mm by 22 mm.[1]
A lithography stepper sits early in the wafer fabrication flow, after surface preparation and photoresist coating and before development and downstream pattern transfer steps.
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The following facts about the FPA 3030 i 5+ Fine Pattern are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the FPA 3030 i 5+ Fine Pattern are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the FPA 3030 i 5+ Fine Pattern are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the FPA 3030 i 5+ Fine Pattern are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the FPA 3030 i 5+ Fine Pattern are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the FPA 3030 i 5+ Fine Pattern is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 10, 2026.
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