CHA
Mark-40
The CHA Mark-40 is a vacuum evaporation system. The CHA Mark-40 is a high vacuum deposition system. The CHA Mark-40 accommodates a wide variety of deposition equipment, including combinations of deposition sources and substrate fixturing.[1]
Plate 01CHA Mark 40 E-Beam Evaporator Training Video
Georgia Tech IENWatch on YouTube
How it works
Applications
The CHA Mark-40 is intended for virtually any application through combinations of deposition sources and substrate fixturing. The CHA Mark-40 accommodates a wide variety of deposition equipment for that purpose.[1][2]
- Deposition equipment configurations for virtually any application
What do the numbers mean?
Vacuum & pumping1
Wafer handling2
Configuration & options3
- Positioning
- Combines the best features of the Mark 50 system with a broad array of options[1]
What replaced it?
Related models
- siblingCHA Mark 50— The source presents Mark-50 alongside Mark-40 and states Mark-40 combines the best features of the Mark 50 system.source[1]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- System typeVacuum Evaporation System[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What kind of equipment is the CHA Mark-40?
The CHA Mark-40 is a vacuum evaporation system used for deposition.[1][2]
What is the basic positioning of the CHA Mark-40 within the product line described here?
The CHA Mark-40 combines features of the Mark 50 system with a broad array of options.[1][2]
Not publicly documented
The following facts about the Mark-40 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Mark-40 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Mark-40 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Mark-40 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Mark-40 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Mark-40 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]web.archive.org — web.archive.orgweb.archive.org
- [2]Mark-40 — CHA | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
Last updated Oct 15, 2026.
Compare with similar tools
View all →
The Applied Materials 0010-13622 is an RF match unit intended for PVD (Physical Vapor Deposition) described as a High Efficiency HE RF Match-Bias.
The Applied Materials 0020 12458 Part is an insulator, side match component for the Hdp-Cvd Ultima Plus system.