CHA
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The CHA Mark 40 is an electron-beam evaporator used for physical vapor deposition in semiconductor and thin-film processing.[1][2]
The CHA Mark 40 is equipped with a four-pocket electron-beam gun that can hold up to four different metal materials, enabling sequential deposition without breaking vacuum.[2]
The system includes a CHA SR10 electron-beam power supply, an Autotech II valve controller, and a CTI 8 cryopump with a CTI compressor, which maintain the high-vacuum environment required for clean deposition.[2]
E-beam evaporators are used for depositing metal layers, contacts, and interconnects in semiconductor devices, as well as for optical coatings, magnetic thin films, and other thin-film applications.
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The following facts about the Mark 40 E-Beam are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Mark 40 E-Beam are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Mark 40 E-Beam are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Mark 40 E-Beam are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Mark 40 E-Beam are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Mark 40 E-Beam is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Sep 1, 2026.
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