CHA
Mark 40 SR 10 E-Beam
The CHA Mark 40 SR 10 E-Beam is an e-beam evaporator. The CHA Mark 40 SR 10 E-Beam is categorized as Deposition. The CHA Mark 40 SR 10 E-Beam is specified with a 6-inch wafer size.[1][2]
What it is
The CHA Mark 40 SR 10 E-Beam is an electron-beam evaporator used for thin-film deposition. The machine is configured for six-inch wafers. The system includes a four-pocket electron beam gun with manual pocket rotation. The system was upgraded to a six-pocket gun. The system includes a CHA SR10 electron beam power supply. The system includes an Autotech II valve controller. The system includes a CTI-8 cryopump. The system includes a CTI 8200 compressor. The system includes a rebuilt 35 CFM dual stage mechanical pump. The system includes a lift-off dome for four-inch wafers. The system includes a new thickness monitor and a new JMI touch screen valve controller.[1][2]
Electron-beam evaporators are a class of physical vapor deposition equipment. The Mark 40 SR 10 E-Beam belongs to the CHA Mark 40 family of deposition tools.[2]
Where it fits in the process flow
What do the numbers mean?
Power & electrical1
- CHA SR10 Electron Beam Power Supply[1]
Vacuum & pumping2
Wafer handling2
- Lift Off Dome for 4” Wafers[1]
Optics & imaging1
- 4 Pocket Electron Beam Gun(Rebuilt), Manual Pocket Rotational[1]
Control & software2
Configuration & options8
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What wafer sizes does the CHA Mark 40 SR 10 E-Beam support?
The Mark 40 SR 10 E-Beam is configured for six-inch wafers, and it includes a lift-off dome for four-inch wafers.[1][2]
Not publicly documented
The following facts about the Mark 40 SR 10 E-Beam are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Mark 40 SR 10 E-Beam are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Mark 40 SR 10 E-Beam are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Mark 40 SR 10 E-Beam are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Mark 40 SR 10 E-Beam are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Mark 40 SR 10 E-Beam is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]waferpedia.com — waferpedia.comwaferpedia.com
Last updated Oct 13, 2026.
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