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Plate 01CHA SE-600-RAP Evaporator #58417
Plate 02CHA SE-600-RAP Evaporator
Plate 03CHA SE-600-RAP E-Beam Evaporator
Wafer size
6 in.
Vacuum
High Vacuum Deposition Systems[3]
The SE-600 can be configured with a variety of fixturing options including planetary, clamshell, or custom fixturing. The SE-600 can use any commercially available source, including single and multiple beam sources, resistance sources, and sputtering sources. The SE-600 can also incorporate automatic deposition control, automatic gun rotation control for turret-type electron beam sources, and shutter designs matched to source configuration and count.[3]
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The SE-600 systems are most often equipped with a 19.5 inch diameter bell jar and planetary fixturing having a capacity of 18 4 inch wafers.[3]
The following facts about the SE-600 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the SE-600 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the SE-600 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the SE-600 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the SE-600 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the SE-600 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 20, 2026.
The Applied Materials 0010-13622 is an RF match unit intended for PVD (Physical Vapor Deposition) described as a High Efficiency HE RF Match-Bias.