EV Group
6200 NT Mask
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The EVG 6200 NT is a mask alignment system for optical double-side lithography and wafer sizes up to 200 mm. The EVG 6200 NT is available in semi-automated or automated configuration and is equipped with integrated vibration isolation. The EVG 6200 NT supports exposure modes including vacuum contact, hard contact, soft contact and proximity mode.[1][2]
Vacuum
Hard, Soft, & Vacuum Contact; Proximity[2]
Performance
≤ ± 0.5 µm[3]
Optics
Mercury light source / UV LED light source[1]
What is it?
What do the numbers mean?
Vacuum & pumping1
Wafer handling5
Optics & imaging4
Performance3
Dimensions & facilities3
Configuration & options1
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Exposure modesHard, Soft, & Vacuum Contact; Proximity[2]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the 6200 NT Mask are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 6200 NT Mask are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 6200 NT Mask are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 6200 NT Mask are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 6200 NT Mask are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 6200 NT Mask is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]evgroup.com — evgroup.comevgroup.com
- [2]Inventory photo
- [3]evgroup.comevgroup.com
- [4]evgroup.comevgroup.com
Last updated Sep 26, 2026.
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