EV Group
EV 640 Mask
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The EVG EV 640 is a mask aligner from EV Group that supports wafer sizes of 6 and 8 inches.[1]
What it is
General reference — not yet source-verifiedMask aligners are lithography tools that bring a photomask into alignment with a wafer and expose photoresist to transfer a pattern. Mask aligners are used where direct mask based exposure is suitable for device layers, packaging layers, micromechanical structures, or similar patterned process steps.
How it works
General reference — not yet source-verifiedMask aligners position a wafer and a mask relative to one another, use alignment marks to register the pattern, and then expose the resist coated wafer through the mask. Mask aligners are generally used for contact, proximity, or closely spaced exposure approaches rather than projection imaging.
Where it fits in the process flow
General reference — not yet source-verifiedMask aligners sit in the lithography portion of the process flow after wafer preparation and photoresist coating. Mask aligners are followed by resist development and then by the pattern transfer step, such as etching, deposition lift off, or implantation masking, depending on the process module.
Applications
General reference — not yet source-verifiedMask aligners are used to define patterned resist layers for semiconductor, microsystem, and related microfabrication work. Mask aligners are commonly applied to layers where overlay to existing wafer features is required and where mask based full field exposure matches the process design.
What do the numbers mean?
Power & electrical2
Wafer handling2
Optics & imaging2
Configuration & options1
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the EV 640 Mask are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the EV 640 Mask are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the EV 640 Mask are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the EV 640 Mask are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the EV 640 Mask are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the EV 640 Mask is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]Inventory photo
- [3]waferpedia.com — waferpedia.comwaferpedia.com
- [4]EV Group EV 640 Mask family | Waferpedia — waferpedia.comwaferpedia.com
Last updated Oct 18, 2026.
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