Hitachi
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The Hitachi CG 4000 CD-SEM is a Critical Dimension Scanning Electron Microscope that supports 12-inch wafer sizes.[1]

A CD-SEM directs a focused beam of electrons across the surface of a wafer and detects secondary electrons emitted from the sample. By scanning the beam and measuring the signal intensity at each position, the instrument constructs a high-magnification image from which critical dimensions such as linewidth, pitch, and sidewall angle are extracted.
CD-SEM tools are used in semiconductor fabs for in-line metrology after photolithography and etching steps. Measurements from the CD-SEM provide feedback to control process uniformity and detect deviations in pattern fidelity before subsequent layers are deposited.
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The Hitachi CG 4000 is a critical dimension scanning electron microscope (CD-SEM).[4][1][5]
The Hitachi CG 4000 CD-SEM supports 12-inch wafers.[1]
The following facts about the CG 4000 CD-SEM are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the CG 4000 CD-SEM are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the CG 4000 CD-SEM are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the CG 4000 CD-SEM are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the CG 4000 CD-SEM are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the CG 4000 CD-SEM is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 13, 2026.
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