Hitachi
S 7800 DR-SEM
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Hitachi S 7800 is a Critical Dimension Scanning Electron Microscope (CD-SEM) used for measuring critical dimensions on 8-inch wafers. The S 7800 achieves a standard resolution of 5 nm at 1 kV and a high-resolution mode of 1 nm in Single Spot X/Y Mode. The S 7800 includes stage travel of 0–200 mm in X and Y, and a throughput of 5 wafers per hour.[1]
What it is
The Hitachi S 7800 DR-SEM is a critical dimension scanning electron microscope for metrology and inspection. The Hitachi S 7800 measures critical dimensions on 8-inch wafers. The Hitachi S 7800 has a standard resolution of 5 nm at 1 kV. The Hitachi S 7800 has a high-resolution mode of 1 nm in Single Spot X/Y Mode. The Hitachi S 7800 has a throughput of 5 wafers per hour.[2][1]
How it works
The Hitachi S 7800 includes stage travel of 0–200 mm in X and 0–200 mm in Y. The Hitachi S 7800 includes stage travel of 4–12 mm in Z. The Hitachi S 7800 includes rotation of 0–360° and tilt of 0–60°. The Hitachi S 7800 has measurement precision of static 3 sigma ±0.010 µm. The Hitachi S 7800 has positioning accuracy in X/Y of ±15 µm. The Hitachi S 7800 has rotation precision of ±60 µm. The Hitachi S 7800 has pre-alignment accuracy in X/Y of ±15 µm. The Hitachi S 7800 includes AutoLive Software, Automatic Beam Current Control, Automatic Sample Control, Automatic Defect Review, and Automatic Navigation. The Hitachi S 7800 includes a chiller and a transformer. The Hitachi S 7800 does not include vacuum pumps in the vacuum system.[2][1]
Where it fits in the process flow
General reference — not yet source-verifiedCritical dimension scanning electron microscopes sit in the measurement and inspection flow around lithography and etch. Critical dimension scanning electron microscopes are commonly used after pattern transfer steps to verify whether printed or etched features match intended dimensions. Critical dimension scanning electron microscopes support process monitoring, excursion analysis, and feedback to patterning and profile-shaping steps.
Applications
General reference — not yet source-verifiedCritical dimension scanning electron microscopes are used for dimensional measurement of patterned semiconductor features on production wafers. Critical dimension scanning electron microscopes are applied to patterned layers where feature width, spacing, hole size, edge placement, and profile-sensitive image interpretation matter to process control. Critical dimension scanning electron microscopes are also used for review of pattern defects and for navigation to specific wafer locations during engineering analysis.
Why won't it start?
Documented failure modes, common issues, and field considerations.
- Stage vibration at higher magnifications
- Hard disk defective
- Process chamber has surface rust
What do the numbers mean?
Vacuum & pumping1
Wafer handling2
Optics & imaging3
Performance4
Control & software1
- Software
- AutoLive Software, Automatic Beam Current Control, Automatic Sample Control, Automatic Defect Review, Automatic Navigation[1]
Dimensions & facilities1
Configuration & options6
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Vacuum SystemVacuum pumps not included[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What is the standard resolution of the Hitachi S 7800?
The Hitachi S 7800 has a standard resolution of 5 nm at 1 kV.[2][1]
What is the high-resolution mode of the Hitachi S 7800?
The Hitachi S 7800 has a high-resolution mode of 1 nm in Single Spot X/Y Mode.[2][1]
Not publicly documented
The following facts about the S 7800 DR-SEM are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the S 7800 DR-SEM are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the S 7800 DR-SEM are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the S 7800 DR-SEM are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the S 7800 DR-SEM is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the S 7800 DR-SEM are on record.
Answerable by: an OEM parts catalog or a service engineer
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]Equipment inventory listing
- [2]S 7800 DR-SEM — Hitachi | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
Last updated Oct 17, 2026.
Compare with similar tools
View all →The KLA .204 PSL Wafer is an 8-inch NIST-traceable reference wafer compatible with Surfscan 6xy0 and Sp1 particle counters.
KLA .496 PSL Wafer is an 8-inch NIST traceable wafer stated to be capable on Surfscan 6xy0 and SP1.
The KLA .498 PSL Wafer is a NIST traceable reference wafer.
