KLA
Provisional entry — research in progress
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Wafer size
For Wafer Centering Device
Optics
Argon Ion Laser (488 nm)[2]
The Surfscan SP 1 DLS uses a 488 nm argon-ion laser as its illumination source. The laser beam is scanned across the wafer surface, and scattered light from defects is collected by photomultiplier tubes. The system achieves a defect sensitivity of 0.050 µm on polished bare silicon, as tested with polystyrene sphere (PSL) reference wafers.[2][3]
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The following facts about the Surfscan SP 1 DLS are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Surfscan SP 1 DLS are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Surfscan SP 1 DLS are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Surfscan SP 1 DLS are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Surfscan SP 1 DLS are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Surfscan SP 1 DLS is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Sep 1, 2026.
The KLA .498 PSL Wafer is a NIST traceable reference wafer.