Waferpedia

Lam Research

2300 e 5 Kiyo EXP Polysilicon

Etch
Research Quality: 30% complete

Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

The Lam 2300 e 5 Kiyo EXP Polysilicon Etch is a 12-inch wafer etch system from Lam Research. The tool is designed for polysilicon etching in semiconductor manufacturing.[1]

Lam Research logo
Fig. — Manufacturer logo, not a photo of this toolWikimedia Commons (see file page for license)

What it is

The Lam Research 2300 e 5 Kiyo EXP is a polysilicon etch system designed for 12-inch wafers.[1]

How it works

General reference — not yet source-verified

Etch chemistry for polysilicon in this tool class generally involves chlorine-based gases, often with oxygen or other additives for profile control.

Where it fits in the process flow

General reference — not yet source-verified

Polysilicon etching is a critical step in the fabrication of CMOS transistors, particularly for gate electrode definition.

The process follows polysilicon deposition and lithographic patterning, and precedes subsequent oxidation, spacer formation, or silicidation steps.

Applications

General reference — not yet source-verified

The tool is applied to the etching of polysilicon layers in logic, memory, and other integrated circuits.

Common applications include gate etch for CMOS transistors, as well as polysilicon structures in flash memory and other non-volatile memory devices.

What do the numbers mean?

Wafer handling1

Wafer Size
12 inch[1]
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Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Not publicly documented

The following facts about the 2300 e 5 Kiyo EXP Polysilicon are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • Fewer than 3 independently cited specifications for the 2300 e 5 Kiyo EXP Polysilicon are on record; the remainder await public documentation.

    Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 2300 e 5 Kiyo EXP Polysilicon are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the 2300 e 5 Kiyo EXP Polysilicon are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the 2300 e 5 Kiyo EXP Polysilicon are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the 2300 e 5 Kiyo EXP Polysilicon are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (1)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
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Last updated Sep 1, 2026.

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