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Lam Research

839 800327 315 ESC

EtchLam Research 839 800327 315 ESC family
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Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

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What it is

The Lam Research 839 800327 315 ESC is an electrostatic chuck intended for use in etching processes. The manufacturer categorizes it as an etch tool.[1][2][3][4]

How it works

General reference — not yet source-verified

During operation, the ESC secures the wafer within a vacuum chamber. An electrostatic force clamps the wafer in place, and the chuck can be biased to influence the energy and direction of ions formed in the plasma.

Where it fits in the process flow

General reference — not yet source-verified

The electrostatic chuck is a key component within the etch module of a semiconductor fabrication line. Wafers are loaded onto the chuck, undergo plasma etching, and are then unloaded for subsequent steps.

Applications

The 839 800327 315 ESC is applied in etch systems for semiconductor processing.[1][2][3]

What do the numbers mean?

Wafer handling1

Wafer size
300mm[1]
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Configuration & options6

Lam 2300 300mm Etch Flex Talon ECT[1]
Accurate?
Etch Flex Talon ECT. Lam 2300 300mm[2]
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Manufacturer
Lam Research[3]
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Category
Etch[3]
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Designation
839 800327 315 ESC[3]
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Associated tool
Lam 2300 300mm Etch Flex Talon ECT[2]
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Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

Who manufactures the 839 800327 315 ESC?

Lam Research manufactures the 839 800327 315 ESC.[1][2][3][4]

What is the model designation of this electrostatic chuck?

The model is 839 800327 315 ESC.[1][2][3][4]

Not publicly documented

The following facts about the 839 800327 315 ESC are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 839 800327 315 ESC are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the 839 800327 315 ESC are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the 839 800327 315 ESC are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the 839 800327 315 ESC are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the 839 800327 315 ESC is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (4)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]waferpedia.com — waferpedia.comwaferpedia.com
  4. [4]Lam Research 839 800327 315 ESC family | Waferpedia — waferpedia.comwaferpedia.com
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Last updated Oct 12, 2026.

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