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Gasonics IPEC 776
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Gasonics IPEC 776 is a chemical mechanical polisher (CMP) for semiconductor wafer planarization. The IPEC 776 processes 200 mm (8 inch) wafers.[1][2]
What it is
How it works
General reference — not yet source-verifiedCMP systems rotate the wafer against a polishing pad while a slurry containing abrasive particles and reactive chemicals is dispensed onto the pad.
The chemical component of the slurry softens or reacts with the material on the wafer surface, while the mechanical action of the abrasive particles removes the reacted layer, achieving global planarization.
Where it fits in the process flow
General reference — not yet source-verifiedCMP is typically performed after deposition processes such as chemical vapor deposition or electroplating, where it removes excess material and levels the wafer topography.
The planarized surface produced by CMP is essential for subsequent photolithography steps, which require a flat and uniform substrate to maintain critical dimension control.
Applications
General reference — not yet source-verifiedCMP is used in the fabrication of integrated circuits for planarizing interlayer dielectrics, shallow trench isolation, and metal interconnects, particularly copper damascene processes.
The process is also applied in advanced packaging, microelectromechanical systems (MEMS), and other semiconductor devices where surface flatness is critical.
What do the numbers mean?
Wafer handling1
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the Gasonics IPEC 776 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
Fewer than 3 independently cited specifications for the Gasonics IPEC 776 are on record; the remainder await public documentation.
Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Gasonics IPEC 776 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Gasonics IPEC 776 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Gasonics IPEC 776 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Gasonics IPEC 776 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]Equipment inventory listing
- [2]Equipment inventory listing
Last updated Aug 20, 2026.
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