Lam Research
Gasonics L 3510
The Gasonics L 3510 is a downstream plasma asher. The Gasonics L 3510 uses a microwave plasma source at 2.45 GHz. The Gasonics L 3510 supports wafer sizes up to 8 inches.[1][2][3][4]
Power
0–1200 watts at 2.45 GHz[2]
Vacuum
Abara A 70 W Dry Pump[1]
Gas delivery
Accurate 354 C Gas Control System[1]
What it is
How it works
Applications
The Gasonics L 3510 is used for photoresist stripping, bulk photoresist removal, descum, semiconductor wafer cleaning, low-damage plasma cleaning, and residue removal.[2][4][9][10]
The Gasonics L 3510 is also used for compound semiconductor processing, MEMS process applications, university environments, research institutes, pilot production, and semiconductor fabrication.[2][4][9][10]
What do the numbers mean?
Power & electrical1
Vacuum & pumping3
- Abara A 70 W Dry Pump[1]
Wafer handling11
- Z-Bot for 6" and 8" Wafers[1]
Gas & chemistry6
- Accurate 354 C Gas Control System[1]
Control & software1
Configuration & options9
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- ConfigurationAbara A 70 W Dry Pump[1]
- ConfigurationAccurate 354 C Gas Control System[1]
- Microwave Power0–1200 watts at 2.45 GHz[2]
- Pressure Range0.5 to >5.0 torr[2]
- Process GasesO₂, N₂ (O₂ 5 SLM, N₂ 1 SLM typical)[2]
- Gas deliveryAccurate 354 C Gas Control System[1]
- Vacuum pumpAbara A 70 W Dry Pump[1]
- Process gasesO2, N2[4]
- Process GasesO2, N2 (O2 5 SLM, N2 1 SLM typical)[2]
- Gas Control SystemAccurate 354 C Gas Control System[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What wafer sizes does the L 3510 support?
The L 3510 supports wafer sizes up to 8 inches (200 mm) and can handle wafers from 75 mm to 200 mm.[2][3][4]
What is the microwave power range?
The microwave power range is 0 to 1200 watts at 2.45 GHz.[2][3][4]
What is the typical throughput?
Typical throughput is 45 to 60 wafers per hour, process dependent.[2][3][4]
Not publicly documented
The following facts about the Gasonics L 3510 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Gasonics L 3510 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Gasonics L 3510 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Gasonics L 3510 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Gasonics L 3510 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Gasonics L 3510 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (10)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]allwin21.com — allwin21.comallwin21.com
- [3]Gasonics L 3510 — Lam Research | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
- [4]waferpedia.com — waferpedia.comwaferpedia.com
- [5]Inventory photo
- [6]Inventory photo
- [7]Inventory photo
- [8]Equipment inventory listing
- [9]Gasonics L3510 plasma Asher semiconductor equipment | SemiStar — semistarcorp.comsemistarcorp.com
- [10]Gasonics L 3510 Plasma Asher Single wafer ,Photoresist removal | SemiStar — semistarcorp.comsemistarcorp.com
Last updated Oct 11, 2026.