Pfeiffer
ACP040G
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
Wafer size
100mm
Vacuum
Chamber primary pump[1]
What it is
How it works
Where it fits in the process flow
General reference — not yet source-verifiedPrimary vacuum pumps for evaporators sit inside the thin-film deposition segment of a microfabrication line. Such pumps support vacuum creation before material evaporation, and they are part of the chamber infrastructure used between substrate loading and film deposition.
Applications
In the EVA 451 thermal evaporator, the pumping system that includes the Pfeiffer ACP040G supports coating of conductive layers used to prepare non-conductive samples for e-beam exposure and to avoid charging issues. The EVA 451 is used for Cr and Al coatings.[1][2]
- Pumping system for an evaporator chamber
What do the numbers mean?
Vacuum & pumping2
Wafer handling1
Configuration & options3
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What is the Pfeiffer ACP040G used for in the EVA 451 system?
The Pfeiffer ACP040G is the chamber primary pump in the Alliance-Concept EVA 451 thermal evaporator.[1][2]
What process does the associated EVA 451 evaporator support?
The EVA 451 is dedicated to coating conductive layers to prepare non-conductive samples for e-beam exposure and avoid charging issues.[1][2]
What materials are used on the EVA 451 associated with the ACP040G?
The EVA 451 is used for Cr and Al coatings.[1]
Not publicly documented
The following facts about the ACP040G are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the ACP040G are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the ACP040G are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the ACP040G are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the ACP040G are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the ACP040G is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]epfl.ch — epfl.chepfl.ch
- [2]waferpedia.com — waferpedia.comwaferpedia.com
Last updated Oct 16, 2026.
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