Waferpedia

MPI

TS2000-IFE

Test & Probe200mmMPI TS2000-IFE family
Research Quality: 50% complete
Email

The MPI TS2000-IFE is a 200 mm fully automated probe system. The MPI TS2000-IFE is designed for mmW, load-pull, silicon photonics, and product engineering applications. The MPI TS2000-IFE supports measurements over a wide temperature range with IceFreeEnvironment operation from -60 °C to +300 °C.[1][2]

MPITS2000-IFE
No photo available yet
  • Plate 01Celadon Systems Indexer with VC20 cores on MPI TS2000-IFE with WaferWallet-Max @Productronica 2023

    ATV Systems GmbHWatch on YouTube
  • Plate 02MPI AST - Innovative Pre-RF Pulsed IV Measurements Maxime Faure AMCAD | TS2000-IFE | EuMW 2023

    MPI ASTWatch on YouTube

Wafer size

200mm

Power

two RF probes of GSG, GSSG or GSGSG types[1]

Performance

micron precision[1]

Optics

microscope and digital camera[1]

What it is

The MPI TS2000-IFE is a fully automated probe system for wafers up to 200 mm. The TS2000-IFE series is positioned for dedicated mmW, load-pull, silicon photonics, and product engineering work. The TS2000-IFE can also be configured with WaferWallet MAX for automated measurement of 100 mm, 150 mm, and 200 mm wafers.[4][3]

How it works

The MPI TS2000-IFE uses programmable chuck motion in X, Y, Z, and theta for wafer positioning. The chuck XY stage has a travel range of 220 x 490 mm, 0.2 μm resolution, accuracy of less than 2.0 μm, repeatability of less than 1 μm, and speed from 10 μm/sec to 50 mm/sec. The chuck Z stage has 30 mm travel, 0.2 μm resolution, accuracy of less than 2.0 μm, repeatability of less than 1.0 μm, and speed from 10 μm/sec to 20 mm/sec. The theta stage has ± 5.0° travel and 0.0001° resolution.[2]

The MPI TS2000-IFE supports simultaneous use of probe cards and MicroPositioners through the IceFreeEnvironment feature, including operation at temperatures down to -60 °C. The platform supports up to 10 DC MicroPositioners or a 4 DC plus 4 RF MicroPositioner setup, and it also supports a 4.5 x 11 inch probe card holder. The TS2000-IFE includes integrated active vibration isolation, automated dew point control through STM, front loading for wafers or single DUTs, and integrated touchscreen-based thermal chuck control. The platen-to-chuck distance is minimized for mmW probing and active probe use.[2]

Where it fits in the process flow

General reference — not yet source-verified

Probe systems are used after wafer fabrication has produced testable structures and before singulation, packaging, or packaged final test. Probe systems support engineering characterization, design validation, failure analysis, reliability studies, and parametric measurement directly on intact wafers. Probe systems can also be used alongside calibration substrates and test structures that are fabricated with the product wafer flow.

Applications

General reference — not yet source-verified

Probe systems are used wherever devices must be measured on wafer before separation from the substrate. Probe systems can support electrical characterization, radio-frequency measurements, photonic device evaluation, sensor testing, and reliability work by presenting stable device contacts to laboratory instruments. In development and failure-analysis settings, probe systems allow repeated access to specific die and structures without requiring packaging.

  • Terahertz small-signal probing

What do the numbers mean?

Power & electrical3

Probe types in standard configuration
two RF probes of GSG, GSSG or GSGSG types[1]
Accurate?
RF VNA
Anritsu 4-Port ME7838G vector network analyzer capable of a single sweep from 70 kHz to 220 GHz[1]
Accurate?
DC bias supply
up to 12 DC bias can be supplied by an Agilent 4156C probe station precision semiconductor parameter analyzer capable of +/-200 V, 0.5 A, and 100 V/us pulses[1]
Accurate?

Wafer handling7

Thermal chuck temperature range
-60°C to +200 °C[1]
Accurate?
Motion/control
probes, microscope, and chuck are automatically controlled in x, y, and z directions with optical feedback[1]
Accurate?
Wafer size
200 mm[1]
Accurate?
Supported wafer sizes
100, 150 or 200 mm[2]
Accurate?
Chuck XY stage travel range
220 x 490 mm[2]
Accurate?
Chuck XY stage resolution
0.2 μm[2]
Accurate?
Chuck XY stage accuracy
< 2.0 μm[2]
Accurate?

Optics & imaging1

Included instruments
microscope and digital camera[1]
Accurate?

Performance1

Precision
micron precision[1]
Accurate?

Configuration & options7

Base tool
MPI TS2000-IFE 200-mm automated probe station[1]
Accurate?
Model
TS2000-IFE[1]
Accurate?
OEM
MPI[1]
Accurate?
Category
Test & Probe[1]
Accurate?
System type
Fully automated probe system[3]
Accurate?
Primary applications
mmW, load-pull, SiPh, and Product Engineering[3]
Accurate?
IceFreeEnvironment temperature range
-60 °C to +300 °C[3]
Accurate?
Interested in this tool?
Need help with this tool?Embed spec card

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Probe types in standard configurationtwo RF probes of GSG, GSSG or GSGSG types[1]
  • RF VNAAnritsu 4-Port ME7838G vector network analyzer capable of a single sweep from 70 kHz to 220 GHz[1]
  • DC bias supplyup to 12 DC bias can be supplied by an Agilent 4156C probe station precision semiconductor parameter analyzer capable of +/-200 V, 0.5 A, and 100 V/us pulses[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Worked with this tool? Help preserve its knowledge →

Frequently asked questions

How many MicroPositioners can the TS2000-IFE platen support?

The probe platen supports up to 10 DC MicroPositioners or a setup of 4 DC plus 4 RF MicroPositioners. The platen also supports a standard 4.5 x 11 inch probe card holder.[2]

What stage performance figures are given for the TS2000-IFE chuck motion system?

The chuck XY stage is specified with 220 x 490 mm travel, 0.2 μm resolution, accuracy below 2.0 μm, repeatability below 1 μm, and speed from 10 μm/sec to 50 mm/sec. The chuck Z stage is specified with 30 mm travel, 0.2 μm resolution, accuracy below 2.0 μm, repeatability below 1.0 μm, and speed from 10 μm/sec to 20 mm/sec. The chuck theta stage is specified with ± 5.0° travel and 0.0001° resolution.[2]

Not publicly documented

The following facts about the TS2000-IFE are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the TS2000-IFE are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the TS2000-IFE are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the TS2000-IFE are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the TS2000-IFE are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the TS2000-IFE is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (4)Every fact above is drawn from these public sources
  1. [1]cnf.cornell.edu — cnf.cornell.educnf.cornell.edu
  2. [2]cnrood.com — cnrood.comcnrood.com
  3. [3]mpi-corporation.jp — mpi-corporation.jpmpi-corporation.jp
  4. [4]TS2000-IFE SERIES: 200 mm Fully Automated Probe Systems with IceFreeEnvironment - Trokut Solutions — trokutsolutions.comtrokutsolutions.com
Was this page accurate?

Last updated Oct 16, 2026.

Compare with similar tools

View all →