Nikon
NSR S 204 B
What it is
General reference — not yet source-verifiedLithography steppers and scanners project circuit patterns from a reticle onto photoresist-coated wafers. Lithography tools of this class are used to define patterned layers that later guide etch, implant, deposition, or lift-off steps in microfabrication.
How it works
General reference — not yet source-verifiedScanner and stepper lithography tools expose resist by optically transferring a reticle pattern onto selected wafer fields while the stage positions each exposure site. Lithography tools of this class combine illumination optics, a projection lens, wafer and reticle stages, alignment sensing, and control software to place successive patterned layers in registration with earlier layers.
Where it fits in the process flow
General reference — not yet source-verifiedPhotolithography tools are used after wafer coating and soft bake, when the wafer is ready for pattern exposure. Patterned wafers from this tool class typically proceed to post-exposure bake and development, followed by process steps such as etch, implantation, deposition patterning, or resist strip depending on the layer being built.
Applications
General reference — not yet source-verifiedLithography steppers and scanners are used to pattern resist for integrated device fabrication and related microfabrication work. Tools in this class support repeated layer definition across the wafer for features such as active regions, interconnect levels, contact patterns, and other masked structures.
- Photolithography
What do the numbers mean?
Power & electrical1
Wafer handling5
Gas & chemistry2
Optics & imaging8
- Pellicle Particle Detector[6]
- 248 nm[9]
- Features
- Chip (table) Leveling; In-Line Right; Tel Track; FIA; Pellicle Particle Detector; Variable NA; Microscope Theta; Signal Tower I/F; Online Interface: Tel ACT 8 Slow; MCSV; OCSV; GOCS; Bar Code Reader; MES Software; AIS; Signal Lamp Tower; RPF (random pattern filter)[6]
Control & software2
Configuration & options24
- Cymer ELS 6400[2]
- Eroupe Safety[6]
- AVIS[6]
- Chip (table) Leveling[6]
- In-Line Right[6]
- Tel Track[6]
- FIA[6]
- Variable NA[6]
- Microscope Theta[6]
- Signal Tower I/F[6]
- with HDD[7]
- (1) WL Type 3[8]
- IU Flare = 2.3%[10]
Vintage & configurations
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| Scanner | — | 2001 | Listed with software version MCSV, CIM SECS, handler system WL Type 3, factory interface Open Cassette, and Cymer ELS 6400 laser. | Equipment inventory listing[2] |
| Stepper / Scanner | — | 2001 | Listed with WL size 200MM, reticle size 6", RL type Standard (no smif), NEMA box 3P 200V, chamber Sendai, lens type 4EN2GK, and Cymer ELS 6400 laser. | Equipment inventory listing[6] |
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- ASML Twinscan XT 1400 F— Same function class: Lithography, nullCompare in depthsource[11]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What reticle size does the NSR S 204 B use?
The scanner uses a 6-inch reticle.[6]
What type of laser is used in the NSR S 204 B?
Not publicly documented
The following facts about the NSR S 204 B are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the NSR S 204 B are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the NSR S 204 B are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the NSR S 204 B are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the NSR S 204 B is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the NSR S 204 B are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (13)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]Inventory photo
- [3]Inventory photo
- [4]Inventory photo
- [5]Inventory photo
- [6]inventory listing
- [7]inventory listing
- [8]inventory listing
- [9]inventory listing
- [10]inventory listing
- [11]Equipment inventory listing
- [12]Equipment inventory listing
- [13]Used Equipment | Nikon Precision | Global Site — nikonprecision.com (Mar 25, 2015)web.archive.org
Last updated Oct 20, 2026.
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The Ultratech 1000 Family is a photolithography step-and-repeat 1X steppers family using the Wynne Dyson optical design.