Waferpedia

Nikon

NSR S 204 B

LithographyNikon NSR S 204 family
Research Quality: 60% complete
LinkedIn X Email
NSR S 204 B — Inventory photo
Fig. 01NSR S 204 BInventory photo[1]

Power

3P 200V[6]

Gas delivery

Donaldson[6]

Optics

6"[6]

What it is

General reference — not yet source-verified

This class of machine transfers circuit patterns from a reticle onto a photoresist-coated wafer during front-end lithography. It is part of the exposure stage that defines features before later etch, deposition, and implant steps build the device structure.

How it works

General reference — not yet source-verified

A lithography scanner exposes the wafer through a patterned reticle with precision motion control between the projection optics, wafer stage, and alignment systems. In this class, the tool repeatedly aligns, exposes, and steps fields across the wafer to create the desired image pattern in photoresist.

Where it fits in the process flow

General reference — not yet source-verified

As a scanner in the exposure cell, it is used where pattern definition must be repeated across many fields on a wafer. In a production flow, that places it near alignment and exposure operations rather than bulk material deposition or final test.

Applications

General reference — not yet source-verified

Lithography scanners of this class are used to form circuit patterns for integrated circuits and other microfabricated devices on coated wafers. They support pattern transfer for production layers that require repeated field exposure and overlay control.

  • Photolithography

What do the numbers mean?

Power & electrical1

NEMA Box
3P 200V[6]
Accurate?

Wafer handling2

Handler System
WL Type 3[1]
Accurate?
Factory Interface
Open Cassette[1]
Accurate?

Gas & chemistry1

Chemical Filter
Donaldson[6]
Accurate?

Optics & imaging4

Reticle Size
6"[6]
Accurate?
Lens Type
4EN2GK[6]
Accurate?
Pellicle Particle Detector[6]
Accurate?
248 nm[9]
Accurate?

Control & software2

Software Version
MCSV[1]
Accurate?
Online Interface
Tel ACT 8 Slow[6]
Accurate?

Configuration & options18

CIM
SECS[1]
Accurate?
Process
Photolithography[1]
Accurate?
Cymer ELS 6400[2]
Accurate?
WL Size
200MM[6]
Accurate?
RL Type
Standard (no smif)[6]
Accurate?
Eroupe Safety[6]
Accurate?
Chamber
Sendai[6]
Accurate?
AVIS[6]
Accurate?
Chip (table) Leveling[6]
Accurate?
In-Line Right[6]
Accurate?
Tel Track[6]
Accurate?
FIA[6]
Accurate?
Variable NA[6]
Accurate?
Microscope Theta[6]
Accurate?
Signal Tower I/F[6]
Accurate?
with HDD[7]
Accurate?
(1) WL Type 3[8]
Accurate?
IU Flare = 2.3%[10]
Accurate?

Vintage & configurations

Documented models & variants

DesignationGenerationVintageChangesSource
Scanner—2001Listed with software version MCSV, CIM SECS, handler system WL Type 3, factory interface Open Cassette, and Cymer ELS 6400 laser.Equipment inventory listing[2]
Stepper / Scanner—2001Listed with WL size 200MM, reticle size 6", RL type Standard (no smif), NEMA box 3P 200V, chamber Sendai, lens type 4EN2GK, and Cymer ELS 6400 laser.Equipment inventory listing[6]
Interested in this tool?
Embed spec card

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • NEMA Box3P 200V[6]
  • Chemical FilterDonaldson[6]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Frequently asked questions

What process is it used for?

It is used for photolithography.[1][2]

Not publicly documented

The following facts about the NSR S 204 B are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the NSR S 204 B are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • The control-system platform and OS era of the NSR S 204 B are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the NSR S 204 B are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the NSR S 204 B is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the NSR S 204 B are on record.

    Answerable by: an OEM parts catalog or a service engineer

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (12)Every fact above is drawn from these public sources
  1. [1]Inventory photo
  2. [2]Inventory photo
  3. [3]Inventory photo
  4. [4]Inventory photo
  5. [5]Inventory photo
  6. [6]inventory listing
  7. [7]inventory listing
  8. [8]inventory listing
  9. [9]inventory listing
  10. [10]inventory listing
  11. [11]Equipment inventory listing
  12. [12]Used Equipment | Nikon Precision | Global Site — nikonprecision.com (Mar 25, 2015)web.archive.org
Was this page accurate?

Last updated Jul 29, 2026.

Compare with similar tools

View all →
017-0024-01 PrealignerBrooks
CategoryLithography
NSR S 204 B vs 017-0024-01 Prealigner →
017-0146-01 PrealignerBrooks
CategoryLithography
NSR S 204 B vs 017-0146-01 Prealigner →
101EV Group

The EVG 101 is an advanced resist processing system for spin or spray coating and developing of wafers up to 300 mm.

CategoryLithography
15 specs
NSR S 204 B vs 101 →
150 e MaskSUSS MicroTec

The SUSS 150 e is a mask aligner manufactured by SUSS MicroTec.

CategoryLithography
NSR S 204 B vs 150 e Mask →
1500Ultratech
CategoryLithography
2 specs
NSR S 204 B vs 1500 →
1505 G 6 ENikon
CategoryLithography
3 specs
NSR S 204 B vs 1505 G 6 E →