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As a macro defect inspection tool, this class of equipment is used to inspect wafers for visible surface defects and general process irregularities before those wafers move on to later manufacturing steps. It belongs to the inspection stage of semiconductor manufacturing rather than to wafer fabrication or electrical test.
Macro defect inspection tools generally illuminate the wafer and use optical imaging to detect surface anomalies, pattern disturbances, contamination, or other defects large enough to be seen by an inspection system. The inspection result is used to flag areas of concern for review or for downstream process control.
This type of system fits in the quality-control flow of wafer processing, typically after a fabrication step that can introduce defects and before later process steps, disposition decisions, or electrical testing. It serves as an intermediate inspection point for wafer-level process monitoring.
For this model, the supported wafer size is 6 inch.[1]
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The following facts about the NSX 220 Macro Defect are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No specifications for the NSX 220 Macro Defect are on record.
Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the NSX 220 Macro Defect are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the NSX 220 Macro Defect are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the NSX 220 Macro Defect are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the NSX 220 Macro Defect are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
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Last updated Jul 30, 2026.
The KLA .204 PSL Wafer is an 8-inch NIST-traceable reference wafer compatible with Surfscan 6xy0 and Sp1 particle counters.
KLA .496 PSL Wafer is an 8-inch NIST traceable wafer stated to be capable on Surfscan 6xy0 and SP1.
The KLA 0035235-003 MMD Head is a TSTD PCB ASSY, MMD MEAS HEAD compatible with the KLA AIT-XP.