Plasma-Therm
720 RIE
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Plasma-Therm 720 RIE is a reactive ion etcher used in semiconductor manufacturing. The Plasma-Therm 720 RIE is configured for four-inch wafers. The Plasma-Therm 720 RIE uses an RF 5 S 500W, 13.56 MHz RF generator.[1][2]
What it is
How it works
General reference — not yet source-verifiedA reactive ion etcher uses a plasma to remove material from a wafer surface with directional ion bombardment and chemically assisted etching.
Where it fits in the process flow
General reference — not yet source-verifiedReactive ion etching is a dry etch process used after pattern definition to transfer mask patterns into underlying thin films or substrates.
Applications
The Plasma-Therm 720 RIE is used for dry plasma etching in semiconductor manufacturing.[1][2]
What do the numbers mean?
Power & electrical4
- RF 5 S 500W, 13.56 MHz RF Generator[1]
Wafer handling1
Configuration & options1
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What type of equipment is the Plasma-Therm 720 RIE?
The Plasma-Therm 720 RIE is a reactive ion etcher used in semiconductor processing.[1][2]
What wafer size is the Plasma-Therm 720 RIE configured for?
The Plasma-Therm 720 RIE is configured for 4 inch wafers.[1][2]
Not publicly documented
The following facts about the 720 RIE are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 720 RIE are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 720 RIE are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 720 RIE are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 720 RIE are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 720 RIE is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]inventory listing
- [2]waferpedia.com — waferpedia.comwaferpedia.com
Last updated Oct 15, 2026.
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