Plasma-Therm
790 Series RIE
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
General reference — not yet source-verifiedReactive ion etchers are dry etch systems that remove material from a substrate by sustaining a low-pressure plasma in a process chamber. Reactive ion etchers are used when a process flow needs patterned material removal after lithography and before later deposition, cleaning, or device-completion steps.
How it works
General reference — not yet source-verifiedReactive ion etchers generally balance chemical reaction from plasma species with directional ion bombardment at the wafer surface. Reactive ion etchers generally use recipe control over gas flow, chamber pressure, RF power, and time to shape etch rate, selectivity, and profile.
Where it fits in the process flow
General reference — not yet source-verifiedReactive ion etchers are typically placed after masking has defined areas to be opened in a film or substrate surface. Reactive ion etchers are commonly followed by resist stripping, chamber cleaning, metrology, or the next deposition or implant step, depending on the device flow.
Applications
The 790 series RIE is used to etch silicon dioxide, silicon nitride, and various polymers. The system allows substrates including silicon, silicon dioxide, glass, sapphire, mica, and ceramic. The system allows masking materials including PMMA, photoresist, and metals such as aluminum, gold, titanium, chromium, and tungsten.[3]
Why won't it start?
Documented failure modes, common issues, and field considerations.
- The automatic vent feature does not work properly.
What do the numbers mean?
Power & electrical1
Wafer handling1
Configuration & options2
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Maximum RF power500 W[3]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What gases does the 790 series RIE use?
The 790 series RIE uses oxygen, nitrogen, sulfur hexafluoride, trifluoromethane, and nitrous oxide as etching gases.[3]
What is the maximum RF power of the 790 series RIE?
The maximum RF power of the 790 series RIE is 500 W.[3]
Does the 790 series RIE support manual and automatic operation?
The control program has both manual and automatic modes. The system can program frequently used sequences and run them in automatic mode.[3]
Not publicly documented
The following facts about the 790 Series RIE are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 790 Series RIE are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 790 Series RIE are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 790 Series RIE are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the 790 Series RIE is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the 790 Series RIE are on record.
Answerable by: an OEM parts catalog or a service engineer
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]Inventory photo
- [3]nist.gov — nist.govnist.gov
Last updated Oct 19, 2026.
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